Photocatalytic oxidation of NO on reduction type semiconductor photocatalysts: effect of metallic Bi on CdS nanorods

被引：58

作者：

Li, Ruina ^{[1
]}

Ou, Xiaoyu ^{[1
]}

Zhang, Li ^{[1
]}

Qi, Zheng ^{[1
]}

Wu, Xiaofeng ^{[1
,2
]}

Lu, Chunshan ^{[3
]}

Fan, Jiajie ^{[4
]}

Lv, Kangle ^{[1
]}

机构：

[1] South Cent Univ Nationalities, Coll Resources & Environm Sci, State Ethn Affairs Commiss, Key Lab Resources Convers & Pollut Control, Wuhan 430074, Hubei, Peoples R China

[2] Tech Univ Darmstadt, Dept Mat & Earth Sci, Surface Sci Lab, Otto Berndt Str 3, D-64287 Darmstadt, Germany

[3] Zhejiang Univ Technol, State Key Lab Green Chem Synth Technol, Hangzhou 310032, Peoples R China

[4] Zhengzhou Univ, Sch Mat Sci & Engn, Zhengzhou 450001, Peoples R China

来源：

CHEMICAL COMMUNICATIONS | 2021年 / 57卷 / 78期

基金：

中国国家自然科学基金;

关键词：

SPHERES; CARBON;

D O I：

10.1039/d1cc03516a

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We report the first visible light photocatalytic oxidation of NO on CdS nanorods (CdS-NRs), one of the typical reduction type semiconductor photocatalysts. The NO removal rate in a continuous reactor sharply increases from 44% to 58% after in situ deposition of Bi nanoplates on CdS-NRs. The LSPR effect of metallic Bi causes the dramatic production of superoxide radicals (O-2(-)) and singlet oxygen (O-1(2)) that are responsible for the oxidation of NO.

引用

页码：10067 / 10070

页数：4

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