Gate-Induced Threshold Voltage Instabilities in p-Gate GaN HEMTs

被引:24
作者
Oeder, Thorsten [1 ]
Pfost, Martin [1 ]
机构
[1] TU Dortmund Univ, Chair Energy Convers, D-44227 Dortmund, Germany
关键词
AlGaN/GaN; electron trapping; gate stress; high-electron-mobility transistor (HEMT); hole accumulation; p-GaN gate; Schottky contact; threshold voltage instability; threshold voltage shift; MECHANISMS; DEVICES; SHIFT;
D O I
10.1109/TED.2021.3098254
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this study, we investigate the threshold voltage (V-th) instability of p-gate GaN HEMTs induced by gate bias. Experimental results are acquired by a custom pulse setup for two commercially available devices with an ohmic gate and a Schottky gate. A transient drain current change is observed, which corresponds to a shift of V-th. A negative Vth instability is identified for the ohmic gate, amostly positive for the Schottky gate that can also become negative depending on the gate bias voltage and duration. The impact of the gate-bias-induced V-th instability on the Schottky-gate device is significantly higher compared to the ohmic-gate device, but clearly noticeable at the nominal rated ON-state gate voltage for both devices. Electron depletion and trapping as well as hole accumulation and trapping are identified to cause this transient V-th instability.
引用
收藏
页码:4322 / 4328
页数:7
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