New Method for the Determination of the Electron Temperature from Langmuir Probe Characteristics

被引:0
作者
Hannemann, M. [1 ]
机构
[1] Leibniz Inst Plasma Sci & Technol Greifswald eV, D-17489 Greifswald, Germany
关键词
Langmuir probe; eedf; electron temperature; shift; smoothing; digital filter; rf-discharge; PLASMA; DISCHARGES;
D O I
10.1002/ctpp.201010135
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The electron retarding current collected by a Langmuir probe in a plasma possessing a Maxwellian electron energy distribution function is a an exponential function. If such a current is smoothed by a non-recursive filter the result is a product of the original current and a factor independent on probe voltage. This leads to a shift between the floating potentials of smoothed and unsmoothed probe current from which the electron temperature V(e) may be obtained. A suitable smoothing filter is chosen and all means necessary for the practical realization of the method are given. The influence of the ion current on the determined value of Ve is investigated. The convenience of the method is shown by means of testing calculations and a measuring example. (C) 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:802 / 807
页数:6
相关论文
共 16 条
[1]   MEASUREMENT OF ELECTRON TEMPERATURE IN A LOW-DENSITY PLASMA BY RADIOFREQUENCY PROBE METHOD [J].
AIHARA, S ;
LAMPIS, G .
LETTERE AL NUOVO CIMENTO, 1971, 2 (25) :1309-&
[2]  
Boschi A., 1963, Il Nuovo Cimento, V29, P487, DOI DOI 10.1007/BF02750367
[3]   THE USE OF LANGMUIR PROBE METHODS FOR PLASMA DIAGNOSTIC IN MIDDLE PRESSURE DISCHARGES [J].
DAVID, P ;
SICHA, M ;
TICHY, M ;
KOPICZYNSKI, T ;
ZAKRZEWSKI, Z .
CONTRIBUTIONS TO PLASMA PHYSICS, 1990, 30 (02) :167-184
[4]   Uniform description of errors in measurement and evaluation of Langmuir probe characteristics by means of apparatus functions [J].
Hannemann, M. .
CONTRIBUTIONS TO PLASMA PHYSICS, 2008, 48 (5-7) :446-452
[5]   The electron kinetics in the cathode region of H2/Ar/N2 discharges [J].
Hannemann, M ;
Hardt, P ;
Loffhagen, D ;
Schmidt, M ;
Winkler, R .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2000, 9 (03) :387-399
[6]   Langmuir probe measurements at incomplete rf-compensation [J].
Hannemann, M. ;
Sigeneger, F. .
CZECHOSLOVAK JOURNAL OF PHYSICS, 2006, 56 :B740-B748
[7]  
HANNEMANN M, 1992, THESIS GREIFSWALD
[8]  
HANNEMANN M, 1995, 7 INP
[9]   DATA SMOOTHING USING LOW-PASS DIGITAL-FILTERS [J].
KAISER, JF ;
REED, WA .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1977, 48 (11) :1447-1457
[10]   Parametrization of Laframboise's results for spherical and cylindrical Langmuir probes [J].
Karamcheti, A ;
Steinbrüchel, C .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1999, 17 (05) :3051-3056