Gate-Tunable Atomically Thin Lateral MoS2 Schottky Junction Patterned by Electron Beam

被引:113
作者
Katagiri, Y. [1 ]
Nakamura, T. [3 ]
Ishii, A. [2 ]
Ohata, C. [1 ]
Hasegawa, M. [2 ]
Katsumoto, S. [3 ]
Cusati, T. [4 ]
Fortunelli, A. [5 ]
Iannaccone, G. [4 ]
Fiori, G. [4 ]
Roche, S. [6 ,7 ,8 ]
Haruyama, J. [1 ]
机构
[1] Aoyama Gakuin Univ, Dept Elect Engn & Elect, 5-10-1 Fuchinobe, Sagamihara, Kanagawa 2525258, Japan
[2] Aoyama Gakuin Univ, Dept Chem & Biol Sci, 5-10-1 Fuchinobe, Sagamihara, Kanagawa 2525258, Japan
[3] Univ Tokyo, Inst Solid State Phys, 5-1-5 Kashiwanoha, Kashiwa, Chiba 2778581, Japan
[4] Univ Pisa, Dipartimento Ingn Informaz, Via G Caruso 16, I-56122 Pisa, Italy
[5] CNR ICCOM, Via Giuseppe Moruzzi 1, I-56124 Pisa, Italy
[6] CSIC, Catalan Inst Nanosci & Nanotechnol, Campus UAB, Barcelona 08193, Spain
[7] Barcelona Inst Sci & Technol, Campus UAB, Barcelona 08193, Spain
[8] Inst Catalana Recerca & Estudis Avancats, ICREA, Barcelona 08070, Spain
关键词
Atomically thin layers; Schottky junction; semiconductor-metal transition; electron-beam irradiation; IT phase; 2-DIMENSIONAL CRYSTALS; GRAPHENE; HETEROSTRUCTURES; TRANSITION; 1T;
D O I
10.1021/acs.nanolett.6b01186
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Among atomically thin two-dimensional (2D) materials, molybdenum disulfide (MoS2) is attracting considerable attention because of its direct bandgap in the 2H semiconducting phase. On the other hand, a 1T-metallic phase has been revealed, bringing complementary application. Recently, thanks to top-down fabrication using electron beam (EB) irradiation techniques, in-plane 1T-metal/2H-semiconductor lateral (Schottky) MoS2 junctions were demonstrated, opening a path toward the co-integration of active and passive two-dimensional devices. Here, we report the first transport measurements evidencing the formation of a MoS2 Schottky barrier (SB) junction with barrier height of 0.13-0.18 eV created at the interface between EB-irradiated (1T)/nonirradiated (2H) regions. Our experimental findings, supported by state-of-the-art simulation, reveal unique device fingerprint of SB-based field-effect transistors made from atom-thin 1T layers.
引用
收藏
页码:3788 / 3794
页数:7
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