An effect of Ar+ ion irradiation on structural and optical properties of electron beam evaporated Cadmium Telluride thin films

被引:0
作者
Shanmugan, S. [1 ]
Mutharasu, D. [1 ]
机构
[1] Univ Sains Malaysia, Nano Optoelect Res Lab, Sch Phys, George Town 11800, Malaysia
来源
OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS | 2010年 / 4卷 / 10期
关键词
Thin films; Ar+ ion irradiation; E-beam; CdTe; Structural properties; Optical properties;
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
CdTe thin films were prepared using e-beam evaporation technique. The prepared films were irradiated by Ar+ ion at different fluency using Multipurpose Al probe as insitu. This could be also used for ion bombardment for cleaning the substrate prior to coating. The prepared and ion irradiated films were confirmed as polycrystalline nature with X-ray technique. From the results, Ar+ ion irradiation enhanced the (111) orientation of CdTe crystals. A considerable modification on structural parameters like crystallite size, lattice parameter, internal strain etc. could be observed as a result of high Ar+ ion fluency. The observed bad gap was increased for higher Ar+ ion fluency. It shows the effect of Ar+ ion irradiation in the modifications of optical properties. The observed results were encouraging on the use of simple multipurpose Al probe for Ar+ ion irradiation process as insitu.
引用
收藏
页码:1617 / 1619
页数:3
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