Optical performance of thin films produced by the pulsed laser deposition of SiAlON and Er targets

被引：6

作者：

Camps, I. ^{[1
]}

Ramirez, J. M. ^{[2
]}

Mariscal, A. ^{[1
]}

Serna, R. ^{[1
]}

Garrido, B. ^{[2
]}

Peralvarez, M. ^{[3
]}

Carreras, J. ^{[3
]}

Barradas, N. P. ^{[4
]}

Alves, L. C. ^{[4
]}

Alves, E. ^{[5
]}

机构：

[1] CSIC, Inst Opt, Laser Proc Grp, Madrid 28006, Spain

[2] Univ Barcelona, Dept Elect, MIND IN2UB, E-08028 Barcelona, Spain

[3] Fundacio Privada Inst Recerca Energia Catalunya, IREC, Catalunya, Spain

[4] Univ Lisbon, Inst Super Tecn, C2TN, P-2695066 Bobadela, Portugal

[5] Univ Lisbon, Inst Super Tecn, IPEN, P-2695066 Bobadela, Portugal

来源：

APPLIED SURFACE SCIENCE | 2015年 / 336卷

关键词：

Pulsed laser deposition; SiAION; Silicon oxynitride; Photoluminescence; Erbium; Refractive index; SILICON; OXYNITRIDE; NITRIDE; LUMINESCENCE; ACTIVATION; PHOSPHORS; EMISSION; ERBIUM; AL2O3;

D O I：

10.1016/j.apsusc.2014.12.013

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We report the preparation and optical performance of thin films produced by pulsed laser deposition in vacuum at room temperature, by focusing an ArF excimer laser onto two separate targets: a commercial ceramic SiA1ON and a metallic Er target. As a result of the alternate deposition Er:SiA1ON films were formed. The as grown films exhibited an Er-related emission peaking at 1532 nm. The role of the PLD energy density during deposition on the final matrix film was investigated, in order to achieve an optimized matrix composition with enhanced optical properties, and its effect on the light emission performance. (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：274 / 277

页数：4

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