Dual self-image technique for beam collimation

被引:7
作者
Maria Herrera-Fernandez, Jose [1 ]
Miguel Sanchez-Brea, Luis [1 ]
Jose Torcal-Milla, Francisco [1 ]
Morlanes, Tomas [2 ]
Bernabeu, Eusebio [1 ]
机构
[1] Univ Complutense Madrid UCM, Appl Opt Complutense Grp, Opt Dept, Fac Ciencias Fs, Plaza Ciencias 1, E-28040 Madrid, Spain
[2] AOTEK S Coop, B San Andres 19, E-20500 Arrasate Mondragon, Guipuzcoa, Spain
关键词
Talbot effect; self-imaging; collimation; diffraction; TALBOT INTERFEROMETRY; GRATINGS; DIFFRACTION; PLATE;
D O I
10.1088/2040-8978/18/7/075608
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We propose an accurate technique for obtaining highly collimated beams, which also allows testing the collimation degree of a beam. It is based on comparing the period of two different self-images produced by a single diffraction grating. In this way, variations in the period of the diffraction grating do not affect to the measuring procedure. Self-images are acquired by two CMOS cameras and their periods are determined by fitting the variogram function of the self-images to a cosine function with polynomial envelopes. This way, loss of accuracy caused by imperfections of the measured self-images is avoided. As usual, collimation is obtained by displacing the collimation element with respect to the source along the optical axis. When the period of both self-images coincides, collimation is achieved. With this method neither a strict control of the period of the diffraction grating nor a transverse displacement, required in other techniques, are necessary. As an example, a LED considering paraxial approximation and point source illumination is collimated resulting a resolution in the divergence of the beam of delta phi = +/- 1.57 mu rad.
引用
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页数:8
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