Influence of the deposition parameters on the physical properties of tin oxide thin films

被引：22

作者：

DiGiulio, M

Serra, A

Tepore, A

Rella, R

Siciliano, P

Mirenghi, L

机构：

[1] IST STUDIO NUOVI MAT ELETTRON,IME,CNR,I-73100 LECCE,ITALY

[2] CNRSM,PASTIS,I-72100 BRINDISI,ITALY

来源：

ADVANCES IN CRYSTAL GROWTH | 1996年 / 203卷

关键词：

sputtering; thin films; gas sensors application;

D O I：

10.4028/www.scientific.net/MSF.203.143

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

Tin oxide thin films have been prepared by using r.f. reactive sputtering technique. Optical, compositional and structural characterization was performed by means of transmission and reflection measurements, X-ray Photoelectron Spectroscopy (XPS) and X-ray Diffraction (XRD) analysis. The conductivity variation in presence of different carbon monoxide concentrations was also studied.

引用

页码：143 / 147

页数：5

共 5 条

[1]

ADVANI G, 1990, J ELECTRON MATER, V9, P29

[2] EFFECTS OF ADDITIONS TO SNO2 THIN-FILMS [J].