Full-field microimaging with 8 keV X-rays achieves a spatial resolutions better than 20 nm

被引：71

作者：

Chen, Tsung-Yu ^{[1
]}

Chen, Yu-Tung ^{[1
]}

Wang, Cheng-Liang ^{[1
]}

Kempson, Ivan M. ^{[1
]}

Lee, Wah-Keat ^{[2
]}

Chu, Yong S. ^{[3
]}

Hwu, Y. ^{[1
,4
,5
]}

Margaritondo, G. ^{[6
]}

机构：

[1] Acad Sinica, Inst Phys, Taipei 115, Taiwan

[2] Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USA

[3] Brookhaven Natl Lab, Natl Synchrotron Light Source 2, Upton, NY 11973 USA

[4] Natl Tsing Hua Univ, Dept Engn & Syst Sci, Hsinchu 300, Taiwan

[5] Natl Cheng Kung Univ, Adv Optoelect Technol Ctr, Tainan 701, Taiwan

[6] Ecole Polytech Fed Lausanne, CH-1015 Lausanne, Switzerland

来源：

OPTICS EXPRESS | 2011年 / 19卷 / 21期

关键词：

E-BEAM LITHOGRAPHY; ZONE-PLATE; FABRICATION; MICROSCOPY; CELLS;

D O I：

10.1364/OE.19.019919

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Fresnel zone plates (450 nm thick Au, 25 nm outermost zone width) used as objective lenses in a full field transmission reached a spatial resolution better than 20 nm and 1.5% efficiency with 8 keV photons. Zernike phase contrast was also realized without compromising the resolution. These are very significant achievements in the rapid progress of high-aspect-ratio zone plate fabrication by combined electron beam lithography and electrodeposition. (C) 2011 Optical Society of America

引用

页码：19919 / 19924

页数：6

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