Composition and texture of TiN thin films fabricated by ECR enhanced sputtering deposition

被引：13

作者：

Liang, Chang-Lin

Cheng, Guo-An ^{[1
]}

Zheng, Rui-Ting

Liu, Hua-Ping

Li, Jie-Chi

Zhang, Hua-Fang

Ma, Guo-Jia

Jiang, Yan-Li

机构：

[1] Beijing Normal Univ, Dept Mat Sci & Engn, Minist Educ, Key Lab Beam Technol & Mat Modificat, Beijing 100875, Peoples R China

[2] Beijing Aeronaut Mfg Technol Res Inst, Natl Key Lab High Energy Dens Beam Proc Technol, Beijing 100024, Peoples R China

来源：

SURFACE & COATINGS TECHNOLOGY | 2007年 / 201卷 / 9-11期

关键词：

TiN films; ECR; composition; texture;

D O I：

10.1016/j.surfcoat.2006.07.107

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

TiN thin films were fabricated on Si (100) substrates using Electron Cyclotron Resonance (ECR) microwave plasma technique. The composition, texture and microstructure of the as-deposited films had been investigated by use of X-ray Photoelectron Spectroscopy, X-ray Diffraction and Scanning Electron Microscopy. TiN compound with atomic ratio N/Ti near 1.2 and (111) preferential orientation was the basic phase, and impurities such as TiO2, Ti2O3 and TiC existed in the films. The cross-sectional morphology of the films was columnar. The effects of the bombardment and the pre-treatment for the substrate surface by energetic ions on the properties of the films were also analyzed. (C) 2006 Elsevier B.V. All rights reserved.

引用

页码：5537 / 5540

页数：4

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