Direct evidence of advantage of Cu(111) for graphene synthesis by using Raman mapping and electron backscatter diffraction

被引:48
作者
Ishihara, Masatou [1 ]
Koga, Yoshinori [1 ]
Kim, Jaeho [1 ]
Tsugawa, Kazuo [1 ]
Hasegawa, Masataka [1 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, Japan
关键词
Single-layer graphene; Few-layer graphene; Thermal chemical vapor deposition; Raman; EBSD; HIGH-QUALITY; LARGE-AREA; FILMS;
D O I
10.1016/j.matlet.2011.06.047
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The advantageous crystallographic orientation of Cu surface for graphene synthesis by using thermal chemical vapor deposition (CVD) is examined by Raman mapping and electron backscatter diffraction. It is found that Cu(111) predominates over (110) and (100) for single- (SLG) or few-layer graphene (FLG) growth. To confirm this result we attempt the synthesis of graphene on Cu(111) single crystal film surfaces. We confirmed the formation of high quality and high uniformity SLG or FLG over more than 97% of the substrate surface area of 10 mm x 10 mm by Raman mapping. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:2864 / 2867
页数:4
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