Skew-faceted elliptical reflector

被引:8
作者
Magarill, Simon [1 ]
机构
[1] iToolS Consulting LLC, Cincinnati, OH 45242 USA
关键词
D O I
10.1364/OL.36.000532
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A light patch created by an illumination optical element often requires having a specific shape and illuminance distribution. This Letter presents a modification of Oliker's elliptical faceted reflector that can work with a very large field of view and provide the required uniformity across a specified target area. (C) 2011 Optical Society of America
引用
收藏
页码:532 / 533
页数:2
相关论文
共 4 条
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Fournier F. R., 2009, P SPIE, V7423
[2]   Fast freeform reflector generation using source-target maps [J].
Fournier, Florian R. ;
Cassarly, William J. ;
Rolland, Jannick P. .
OPTICS EXPRESS, 2010, 18 (05) :5295-5304
[3]  
MAGARILL S, 2010, P SPIE, V7785
[4]  
Oliker V., 2006, COMPUTING LETT, V2, P29, DOI DOI 10.1163/157404006777491981