Removal of formaldehyde by a pulsed dielectric barrier discharge in dry air in the 20 °C to 300 °C temperature range

被引:11
作者
Blin-Simiand, N. [1 ]
Pasquiers, S. [1 ]
Magne, L. [1 ]
机构
[1] Univ Paris 11, CNRS, Phys Gaz & Plasmas Lab, UMR8578, Bat 210, F-91405 Orsay, France
关键词
formaldehyde; dielectric barrier discharge; non-thermal plasma kinetics; volatile organic compounds; environmental application; NONTHERMAL PLASMA; POLLUTION CONTROL; OXIDATION;
D O I
10.1088/0022-3727/49/19/195202
中图分类号
O59 [应用物理学];
学科分类号
摘要
The influence of the gas mixture temperature, from 20 degrees C up to 300 degrees C, on the removal of formaldehyde, diluted at low concentration (less than 800 ppm) in dry air at atmospheric pressure, by a pulsed dielectric barrier discharge (DBD) is studied by means of Fourier transform infrared spectroscopy and micro gas chromatography. Efficient removal of CH2O is obtained and it is found that the characteristic energy, less than 200 J l(-1), is a decreasing function of the temperature over the whole range of concentration values under consideration. Byproducts issued from the removal are identified and quantified (CO, CO2, HCOOH, HNO3). Experimental results are analysed using a zero-dimensional simplified DBD-reactor model in order to gain insights on the chemical processes involved. It is shown that the dissociation of the molecule competes with oxidation reactions at low temperature, whereas at high temperature oxidation processes dominate.
引用
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页数:12
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