Removal of formaldehyde by a pulsed dielectric barrier discharge in dry air in the 20 °C to 300 °C temperature range
被引:11
作者:
Blin-Simiand, N.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Paris 11, CNRS, Phys Gaz & Plasmas Lab, UMR8578, Bat 210, F-91405 Orsay, FranceUniv Paris 11, CNRS, Phys Gaz & Plasmas Lab, UMR8578, Bat 210, F-91405 Orsay, France
Blin-Simiand, N.
[1
]
Pasquiers, S.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Paris 11, CNRS, Phys Gaz & Plasmas Lab, UMR8578, Bat 210, F-91405 Orsay, FranceUniv Paris 11, CNRS, Phys Gaz & Plasmas Lab, UMR8578, Bat 210, F-91405 Orsay, France
Pasquiers, S.
[1
]
论文数: 引用数:
h-index:
机构:
Magne, L.
[1
]
机构:
[1] Univ Paris 11, CNRS, Phys Gaz & Plasmas Lab, UMR8578, Bat 210, F-91405 Orsay, France
The influence of the gas mixture temperature, from 20 degrees C up to 300 degrees C, on the removal of formaldehyde, diluted at low concentration (less than 800 ppm) in dry air at atmospheric pressure, by a pulsed dielectric barrier discharge (DBD) is studied by means of Fourier transform infrared spectroscopy and micro gas chromatography. Efficient removal of CH2O is obtained and it is found that the characteristic energy, less than 200 J l(-1), is a decreasing function of the temperature over the whole range of concentration values under consideration. Byproducts issued from the removal are identified and quantified (CO, CO2, HCOOH, HNO3). Experimental results are analysed using a zero-dimensional simplified DBD-reactor model in order to gain insights on the chemical processes involved. It is shown that the dissociation of the molecule competes with oxidation reactions at low temperature, whereas at high temperature oxidation processes dominate.
机构:
Univ Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Blin-Simiand, Nicole
Heninger, Michel
论文数: 0引用数: 0
h-index: 0
机构:
Univ Paris 11, AlyXan, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Heninger, Michel
Mestdagh, Helene
论文数: 0引用数: 0
h-index: 0
机构:
Univ Paris 11, CNRS, UMR 8000, Chim Phys Lab, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Mestdagh, Helene
Boissel, Pierre
论文数: 0引用数: 0
h-index: 0
机构:
Univ Paris 11, AlyXan, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Boissel, Pierre
论文数: 引用数:
h-index:
机构:
Jorand, Francois
Lemaire, Joel
论文数: 0引用数: 0
h-index: 0
机构:
Univ Paris 11, CNRS, UMR 8000, Chim Phys Lab, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Lemaire, Joel
Leprovost, Julien
论文数: 0引用数: 0
h-index: 0
机构:
Univ Paris 11, AlyXan, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Leprovost, Julien
Pasquiers, Stephane
论文数: 0引用数: 0
h-index: 0
机构:
Univ Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Pasquiers, Stephane
Popa, Gheorghe
论文数: 0引用数: 0
h-index: 0
机构:
Alexandru Ioan Cuza Univ, Fac Phys, Dept Plasma Phys, Iasi 700506, RomaniaUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Popa, Gheorghe
Postel, Christian
论文数: 0引用数: 0
h-index: 0
机构:
Univ Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
机构:
Univ Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Blin-Simiand, Nicole
Heninger, Michel
论文数: 0引用数: 0
h-index: 0
机构:
Univ Paris 11, AlyXan, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Heninger, Michel
Mestdagh, Helene
论文数: 0引用数: 0
h-index: 0
机构:
Univ Paris 11, CNRS, UMR 8000, Chim Phys Lab, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Mestdagh, Helene
Boissel, Pierre
论文数: 0引用数: 0
h-index: 0
机构:
Univ Paris 11, AlyXan, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Boissel, Pierre
论文数: 引用数:
h-index:
机构:
Jorand, Francois
Lemaire, Joel
论文数: 0引用数: 0
h-index: 0
机构:
Univ Paris 11, CNRS, UMR 8000, Chim Phys Lab, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Lemaire, Joel
Leprovost, Julien
论文数: 0引用数: 0
h-index: 0
机构:
Univ Paris 11, AlyXan, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Leprovost, Julien
Pasquiers, Stephane
论文数: 0引用数: 0
h-index: 0
机构:
Univ Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Pasquiers, Stephane
Popa, Gheorghe
论文数: 0引用数: 0
h-index: 0
机构:
Alexandru Ioan Cuza Univ, Fac Phys, Dept Plasma Phys, Iasi 700506, RomaniaUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Popa, Gheorghe
Postel, Christian
论文数: 0引用数: 0
h-index: 0
机构:
Univ Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France