Synthesis and lithographic patterning of polycarbosilanes with pendant cobalt carbonyl clusters

被引：24
作者：
Greenberg, S
Clendenning, SB
Liu, K
Manners, I
Aouba, S
Ruda, HE
机构：
[1] Univ Toronto, Dept Chem, Toronto, ON M5S 3H6, Canada
[2] Univ Toronto, Ctr Adv Nanotechnol, Toronto, ON M5S 3H6, Canada
来源：
MACROMOLECULES | 2005年 / 38卷 / 06期
关键词：
D O I：
10.1021/ma048368u
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
The synthesis of highly metallized (25 wt% Co) polycarbosilane (PCS) by ring opening polymerization of an acetylide substituted 1-silacyclobutane followed by clusterization with [Co2(CO)8] was discussed. The acetylide-substituted silacyclobutane 2 was prepared by the reaction of Li[CξCPh] with 1-chloro-1-methylsilacyclobutane. A convenient method for molecular weight control was also demonstrated using a silane capping reagent. The application of Co-PCS as resist for EBL in the direct writing of cobalt-rich patterned films was also elaborated.
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页码：2023 / 2026
页数：4
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