Enhanced heating in plasma bulk due to electron cyclotron resonance in weakly magnetized capacitively coupled plasmas

被引:8
作者
Zhang, Quan-Zhi [1 ]
Liu, Jia-Rui [1 ]
Liu, Yong-Xin [1 ]
Lu, Wen-Qi [1 ]
Sun, Jing-Yu [1 ]
Wang, You-Nian [1 ]
机构
[1] Dalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
基金
中国国家自然科学基金;
关键词
radio frequency; magnetized capacitively coupled plasmas; electron cyclotron resonance; POWER; MAGNETRON;
D O I
10.1088/1361-6595/ac7903
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
An enhanced electron heating mechanism based on a resonance between the cyclotron motion of electrons and radio frequency (rf) electric field in the plasma bulk is reported in weakly magnetized capacitively coupled argon plasmas at low pressure. When the electron cyclotron frequency coincides with the applied power source frequency, the bulk electrons can continuously acquire energy from the background electric field within certain rf periods during the cyclotron motion, inducing overall distinct increase of excitation rate and electron temperature in the plasma bulk. This enhanced electron heating effect has been examined by a combination of kinetic particle simulations, experimental measurements, and an analytical model, and the dynamics of electrons are revealed at resonant conditions.
引用
收藏
页数:6
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共 21 条
[1]   RF discharge under the influence of a transverse magnetic field [J].
Barnat, E. V. ;
Miller, P. A. ;
Paterson, A. M. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2008, 17 (04)
[2]   Plasma etching: Yesterday, today, and tomorrow [J].
Donnelly, Vincent M. ;
Kornblit, Avinoam .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2013, 31 (05)
[3]   Modulation of uniform magnetic field on electron dynamics in low-pressure capacitively coupled plasmas [J].
Guo, Yu-Qing ;
Sun, Jing-Yu ;
Zhang, Quan-Zhi ;
Ma, Fang-Fang ;
Liu, Xiang-Mei ;
Wang, You-Nian .
PLASMA PROCESSES AND POLYMERS, 2021, 18 (09)
[4]   High aspect ratio etched sub-micron structures in silicon obtained by cryogenic plasma deep-etching through perforated polymer thin films [J].
Kulsreshath, M. ;
Vital, A. ;
Lefaucheux, P. ;
Sinturel, C. ;
Tillocher, T. ;
Vayer, M. ;
Boufnichel, M. ;
Dussart, R. .
MICRO AND NANO ENGINEERING, 2018, 1 :42-48
[5]   Modeling of magnetically enhanced capacitively coupled plasma sources: Ar discharges [J].
Kushner, MJ .
JOURNAL OF APPLIED PHYSICS, 2003, 94 (03) :1436-1447
[6]   High power impulse magnetron sputtering using a rotating cylindrical magnetron [J].
Leroy, W. P. ;
Mahieu, S. ;
Depla, D. ;
Ehiasarian, A. P. .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2010, 28 (01) :108-111
[7]   MODEL OF MAGNETICALLY ENHANCED, CAPACITIVE RF DISCHARGES [J].
LIEBERMAN, MA ;
LICHTENBERG, AJ ;
SAVAS, SE .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1991, 19 (02) :189-196
[8]   Experimental validation and simulation of collisionless bounce-resonance heating in capacitively coupled radio-frequency discharges [J].
Liu, Yong-Xin ;
Zhang, Quan-Zhi ;
Jiang, Wei ;
Lu, Wen-Qi ;
Wang, You-Nian .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2012, 21 (03)
[9]   Collisionless Bounce Resonance Heating in Dual-Frequency Capacitively Coupled Plasmas [J].
Liu, Yong-Xin ;
Zhang, Quan-Zhi ;
Jiang, Wei ;
Hou, Lu-Jing ;
Jiang, Xiang-Zhan ;
Lu, Wen-Qi ;
Wang, You-Nian .
PHYSICAL REVIEW LETTERS, 2011, 107 (05)
[10]   Enhancement of ohmic and stochastic heating by resonance effects in capacitive radio frequency discharges: A theoretical approach [J].
Mussenbrock, T. ;
Brinkmann, R. P. ;
Lieberman, M. A. ;
Lichtenberg, A. J. ;
Kawamura, E. .
PHYSICAL REVIEW LETTERS, 2008, 101 (08)