Direct measurement of the Josephson plasma resonance frequency from I-V characteristics

被引:7
作者
Kleinsasser, AW
Johnson, MW
Delin, KA
机构
[1] CALTECH, Jet Prop Lab, Pasadena, CA 91109 USA
[2] Northrop Grumman Space Technol, Redondo Beach, CA 90278 USA
关键词
Josephson devices; Josephson junctions; superconducting devices; superconductor-insulator-superconductor devices;
D O I
10.1109/TASC.2005.849700
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The speed of Josephson circuits such as those required for Rapid Single Flux Quantum logic is limited by the Josephson plasma frequency, omega(p), which (with few exceptions) increases monotonically with increasing critical current density, J(c). Here we describe a new technique for directly measuring omega(p), using the current-voltage characteristics of a simple structure based on externally-shunted, series-connected tunnel junctions. We present both experimental and theoretical demonstrations of the technique and describe its application to the determination of the junction capacitance, a property poorly characterized for high-J(c) junctions.
引用
收藏
页码:86 / 89
页数:4
相关论文
共 6 条
[1]  
Barone A., 1982, PHYS APPL JOSEPHSON
[2]  
BARONE A, 1982, PHYSICS APPLICATIONS, pCH1
[3]   HIGH-QUALITY REFRACTORY JOSEPHSON TUNNEL-JUNCTIONS UTILIZING THIN ALUMINUM LAYERS [J].
GURVITCH, M ;
WASHINGTON, MA ;
HUGGINS, HA .
APPLIED PHYSICS LETTERS, 1983, 42 (05) :472-474
[4]  
KAPLUNENKO VK, P 1987 INT SUP EL C, P127
[5]   SUB-MU-M, PLANARIZED, NB-ALOX-NB JOSEPHSON PROCESS FOR 125-MM WAFERS DEVELOPED IN PARTNERSHIP WITH SI TECHNOLOGY [J].
KETCHEN, MB ;
PEARSON, D ;
KLEINSASSER, AW ;
HU, CK ;
SMYTH, M ;
LOGAN, J ;
STAWIASZ, K ;
BARAN, E ;
JASO, M ;
ROSS, T ;
PETRILLO, K ;
MANNY, M ;
BASAVAIAH, S ;
BRODSKY, S ;
KAPLAN, SB ;
GALLAGHER, WJ ;
BHUSHAN, M .
APPLIED PHYSICS LETTERS, 1991, 59 (20) :2609-2611
[6]   SPECIFIC CAPACITANCE OF JOSEPHSON TUNNEL-JUNCTIONS [J].
MAGERLEIN, JH .
IEEE TRANSACTIONS ON MAGNETICS, 1981, 17 (01) :286-289