Laser ablation of boron-carbide target

被引:0
作者
Henc-Bartolic, V
Kovacevic, E
Kunze, HJ
Atwee, T
Stubicar, M
机构
[1] Univ Zagreb, Fac Elect & Comp Engn, HR-10000 Zagreb, Croatia
[2] Ruhr Univ Bochum, Inst Phys Expt, D-44780 Bochum, Germany
[3] Univ Zagreb, Fac Sci, HR-10000 Zagreb, Croatia
来源
STROJARSTVO | 2002年 / 44卷 / 3-6期
关键词
boron-carbide target; laser ablation; particulates; plasma; ruby laser;
D O I
暂无
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
Ruby laser beam (FWHM 12 ns, average energy 3,2 J and intensity 130 GW/cm(2)) has been focused perpendicularly onto a flat B4C target. The time-resolved spectra of the B4C plasmas in the spectral region 16...32 nm at different distances from the target surface have been analyzed. The spectral lines of high-ionized carbon and boron atoms have been observed. The B4C target has been situated perpendicularly to the end of a flat smooth carbon plate and the shape of the plasma plume visualized on a carbon plate. The inner zone of the shape shows plasma cloud in a gaseous state expanding in the shape of a fan. In the outer zone solidified particulates (droplets) have been noticed. The formation of particulates is the most probably caused by interaction of the hot plasma with the cold carbon plate at the room temperature.
引用
收藏
页码:117 / 121
页数:5
相关论文
共 10 条
  • [1] A spectroscopic study of plasmas produced by laser ablation of hollow aluminium targets
    Andreic, Z
    Aschke, L
    Kunze, HJ
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1998, 31 (12) : 1487 - 1491
  • [2] GRIEM HR, 1997, PRINCIPLES SPECTROSC
  • [3] Pulsed-laser deposition and boron-blending of diamond-like carbon (DLC) thin films
    Kautek, W
    Pentzien, S
    Conradi, A
    Kruger, J
    Brzezinka, KW
    [J]. APPLIED SURFACE SCIENCE, 1996, 106 : 158 - 165
  • [4] KELLY RL, 1987, J PHYS CHEM REF D S1, V16
  • [5] ODERKACH O, 1997, INT SOC OPT ENG P SP, V2991, P48
  • [6] Properties of boron-carbon-nitrogen ternary thin films synthesized by pulsed laser deposition
    Ren, ZM
    Lu, YF
    Mai, ZH
    Cheong, BA
    Chow, SK
    Wang, JP
    Chong, TC
    [J]. LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING IV, 1999, 3618 : 520 - 528
  • [7] REN ZM, 1977, MATER CHEM PHYS, V50, P98
  • [8] VONALLMEN M, 1987, LASER BEAM INTERACTI
  • [9] VONALLMEN M, 1966, CATALOG GOODFELOW
  • [10] WIESE WL, J PHYS CHEM REF DATA, V7