Using ellipsometry for the evaluation of surface damage and sputtering yield in organic films with irradiation of argon cluster ion beams

被引：9

作者：

Hada, Masaki ^{[1
]}

Ninomiya, Satoshi ^{[2
]}

Seki, Toshio ^{[1
]}

Aoki, Takaaki ^{[3
]}

Matsuo, Jiro ^{[2
]}

机构：

[1] Kyoto Univ, Dept Nucl Engn, Sakyo Ku, Kyoto 6068501, Japan

[2] Kyoto Univ, Quantum Sci & Engn Ctr, Kyoto 6110011, Japan

[3] Kyoto Univ, Dept Elect Sci & Engn, Kyoto 6158530, Japan

来源：

SURFACE AND INTERFACE ANALYSIS | 2011年 / 43卷 / 1-2期

关键词：

cluster ion; optical method; damage evaluation; L-leucine; MASS-SPECTROMETRY; OPTICAL-CONSTANTS;

D O I：

10.1002/sia.3452

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The film thickness and surface damage layer of vapor-deposited L-leucine amino acid films irradiated with Ar cluster ion beams were characterized by PSC(R)A ellipsometry. The damaged layer on the surface of the L-leucine film irradiated with Ar cluster ion beam was quite thin, less than 1 nm in thickness. In contrast, films irradiated with Ar monomer ion beam have changed into totally different films. The ellipsometry method also allowed accurate measurements of the sputtering yield from the L-leucine film irradiated with Ar cluster ion beams at nm-order resolution. These results suggested that with proper analysis, the optical method of ellipsometry enables estimation of the surface damage layer and measurement of sputtering yield of organic films irradiated with cluster ion beams. Copyright (C) 2010 John Wiley & Sons, Ltd.

引用

页码：84 / 87

页数：4

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