Study on structural, morphological, optical, and luminescence properties of nickel oxide thin-film synthesized by dip-coating technique

被引:5
作者
Anusha, S. [1 ]
Ravinder, G. [1 ]
Murthi, M. Narasimha [1 ]
Rao, P. Chandar [1 ]
Sreelatha, C. J. [1 ]
机构
[1] Kakatiya Univ, Dept Phys, Mat Res Lab, Warangal, Telangana, India
关键词
Nickel oxide; Dip coating; XRD; FESEM; Photo luminescence; ELECTROCHEMICAL PROPERTIES; ELECTRICAL-PROPERTIES;
D O I
10.1016/j.matpr.2021.11.378
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nickel oxide is one of the best materials for fabricating optical devices. The Dip-coating technique was used to deposit nickel oxide thin films on a glass substrate. Nickel acetate tetrahydrate Ni (Ac) 2 center dot H2O was used as starting precursor and monoethanolamine (MEA) was added as a catalyst. These fabricated films were pre-heated at 150 degrees C for 10 min and then annealed in the air at 400-700 degrees C temperatures. XRD, UV-Vis-NIR, FESEM, EDAX, and photoluminescence techniques are used for analyzing the fabricated films. FESEM and EDAX studies confirmed the surface and the elemental analysis of the prepared films. X-ray diffraction studies confirmed the structure of the Nickel oxide film. The UV-Vis-NIR spectrometer was used to analyze the transmission and absorption spectra of the films. Copyright (C) 2022 Elsevier Ltd. All rights reserved. Selection and peer-review under responsibility of the scientific committee of the International Conference on Smart and Sustainable Developments in Materials, Manufacturing and Energy Engineering
引用
收藏
页码:1733 / 1738
页数:6
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