Hydrogen passivation of nitrogen in SiC

被引:21
作者
Gali, A
Deák, P
Son, NT
Janzén, E
机构
[1] Budapest Univ Technol & Econ, Dept Atom Phys, H-1111 Budapest, Hungary
[2] Linkoping Univ, Dept Phys & Measurement Technol, S-58183 Linkoping, Sweden
关键词
D O I
10.1063/1.1604461
中图分类号
O59 [应用物理学];
学科分类号
摘要
First-principles calculations carried out in 4H-SiC show that hydrogen may form stable complexes with substitutional nitrogen, passivating the shallow nitrogen donor. The complex is very stable with respect to isolated positive donors and negatively charged hydrogen interstitials, so reactivation is expected only at high temperature. The binding energy also increases the concentration of hydrogen, incorporated into 4H-SiC during growth or postgrowth hydrogenation. (C) 2003 American Institute of Physics.
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收藏
页码:1385 / 1387
页数:3
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