Patterning techniques for mesostructured films

被引：74
作者：
Innocenzi, Plinio [1 ,2 ]
Kidchob, Tongjit [1 ,2 ]
Falcaro, Paolo [3 ]
Takahashi, Masahide [1 ,2 ]
机构：
[1] Univ Sassari, CR INTSM, DAP, Lab Sci Mat & Nanotecnol, I-07041 Sassari, Italy
[2] Univ Sassari, Nanworld Inst, I-07041 Sassari, Italy
[3] Assoc CIVEN Nano Fabricat Facil, I-30175 Venice, Italy
来源：
CHEMISTRY OF MATERIALS | 2008年 / 20卷 / 03期
关键词：
D O I：
10.1021/cm071784j
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Patterning mesostructured films is becoming an important area of research for its technological implications. Self-assembled mesoporous materials synthesized through templating of nano-objects offer, in fact, the possibility of hosting active organic molecules or nanoparticles, and several applications in photonics and microelectronics are now emerging. At the same time, new "unconventional" lithographic techniques are also available to design nano- or microscale patterned mesoporous structures. We discuss the recent developments of lithographic methods for patterning mesoporous materials; some applications and future trends are also envisaged in the present review.
引用
收藏
页码：607 / 614
页数：8
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