Measurement of hardness, surface potential, and charge distribution with dynamic contact mode electrostatic force microscope

被引:109
作者
Hong, JW [1 ]
Park, SI
Khim, ZG
机构
[1] Seoul Natl Univ, Dept Phys, Seoul 151742, South Korea
[2] Seoul Natl Univ, Condensed Matter Res Inst, Seoul 151742, South Korea
关键词
D O I
10.1063/1.1149660
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Dynamic contact mode electrostatic force microscopy (DC-EFM) was developed as a new operation mode of scanning probe microscope (SPM). By operating EFM in a contact mode with an ac modulation bias, we have improved the spatial resolution and also achieved a complete separation of the topographic effect from other electrostatic force effect overcoming the mixing problem of a topographic effect with other electrostatic effects frequently encountered in the conventional noncontact EFM measurement. DC-EFM can be utilized either as a force microscopy for the surface hardness, or as a potentiometry for the surface potential distribution, or as a charge densitometry for the surface charge density study. This is also applicable to the measurement and control of the domain structure in ferroelectric materials that have a bound surface charge. (C) 1999 American Institute of Physics. [S0034-6748(99)01703-7].
引用
收藏
页码:1735 / 1739
页数:5
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