Nanoindentation of binary and ternary Ni-Ti-based shape memory alloy thin films

被引:43
作者
Wood, A. J. Muir [1 ]
Sanjabi, S. [2 ]
Fu, Y. Q. [3 ]
Barber, Z. H. [1 ]
Clyne, T. W. [1 ]
机构
[1] Univ Cambridge, Dept Mat Sci & Met, Cambridge CB2 3QZ, England
[2] Tarbiat Modares Univ, Fac Engn, Dept Mat Sci & Engn, Tehran, Iran
[3] Heriot Watt Univ, Dept Mech Engn, Edinburgh EH14 4AS, Midlothian, Scotland
基金
英国工程与自然科学研究理事会;
关键词
nickel-titanium; nickel-titanium-copper; nickel-titanium-hafnium; thin film; shape memory; indentation;
D O I
10.1016/j.surfcoat.2007.11.011
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Thin sputtered films of binary (Ni-Ti) and ternary (Ni-Ti-Hf and Ni-Ti-Cu) shape memory alloys have been subjected to nanoindentation over a range of temperature (up to 400 degrees C), using a small diameter spherical indenter. The load-displacement plots obtained during these experiments have been interpreted so as to reveal whether the imposed strain was being at least partly accommodated by the martensitic phase transformation, ie whether superelastic deformation was taking place. This was done by evaluating the remnant indent depth ratio (depth after unloading/depth at peak load), which is expected to have a relatively small value if superelastic deformation and recovery are significant. It is confirmed that this procedure, which has previously been validated for bulk material, can be applied to these thin films (similar to 2 mu m in thickness). The results indicate that ternary alloys with up to about 20 at.%Hf or 10 at.%Cu can exhibit superelastic behaviour over suitable temperature ranges. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:3115 / 3120
页数:6
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