Spin Coating and Micro-Patterning Optimization of Composite Thin Films Based on PVDF

被引：25

作者：

Anh Ngoc Nguyen ^{[1
,2
]}

Solard, Jeanne ^{[3
]}

Huyen Thi Thanh Nong ^{[1
,4
]}

Ben Osman, Chirine ^{[5
]}

Gomez, Andres ^{[6
]}

Bockelee, Valerie ^{[1
]}

Tence-Girault, Sylvie ^{[7
]}

Schoenstein, Frederic ^{[1
]}

Simon-Sorbed, Maite ^{[6
]}

Esther Carrillo, Anna ^{[6
]}

Mercone, Silvana ^{[1
]}

机构：

[1] Univ Sorbonne Paris Nord USPN, Lab Sci Proc & Mat LSPM CNRS UPR 3407, Villetaneuse 93430, France

[2] Vietnam Acad Sci & Technol, Inst Mat Sci, Hanoi, Vietnam

[3] Univ Sorbonne Paris Nord USPN, Lab Phys Lasers LPL CNRS UMR 7538, Villetaneuse 93430, France

[4] Lorraine Univ Campus Artem, Inst Jean Lamour, UMR CNRS 7198, Nancy 54000, France

[5] SOLVAY, Courbevoie 92400, France

[6] Inst Ciencia Mat Barcelona ICMAB CSIC, Campus UAB, Bellaterra 08193, Spain

[7] HESAM Univ, Arts & Metiers Inst Technol, PIMM, CNRS,Cnam, 151 Blvd Hop, Paris 75013, France

来源：

MATERIALS | 2020年 / 13卷 / 06期

关键词：

PVDF; spin coating; magnetic nanoparticles; composite thin films; POLY(VINYLIDENE FLUORIDE); POLYOL MEDIUM; NANOPARTICLES; FABRICATION; HYDROLYSIS; COPOLYMER; PHASES; METAL; BETA;

D O I：

10.3390/ma13061342

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We optimize the elaboration of very thin film of poly(vinylidene fluoride) (PVDF) polymer presenting a well-controlled thickness, roughness, and nano-inclusions amount. We focused our effort on the spin coating elaboration technique which is easy to transfer to an industrial process. We show that it is possible to obtain continuous and smooth thin films with mean thicknesses of 90 nm by properly adjusting the concentration and the viscosity of the PVDF solution as well as the spin rate and the substrate temperature of the elaboration process. The electro-active phase content versus the magnetic and structural properties of the composite films is reported and fully discussed. Last but not least, micro-patterning optical lithography combined with plasma etching has been used to obtain well-defined one-dimensional micro-stripes as well as squared-rings, demonstrating the easy-to-transfer silicon technology to polymer-based devices.

引用

页数：18

共 56 条

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