Charge control of micro-particles in a shielded plasma afterglow

被引：30

作者：

van Minderhout, B. ^{[1
]}

van Huijstee, J. C. A. ^{[1
]}

Platier, B. ^{[1
]}

Peijnenburg, T. ^{[2
]}

Blom, P. ^{[2
]}

Kroesen, G. M. W. ^{[1
]}

Beckers, J. ^{[1
]}

机构：

[1] Eindhoven Univ Technol, Dept Appl Phys, POB 513, NL-5600 MB Eindhoven, Netherlands

[2] VDL Enabling Technol Grp, POB 80038, NL-5600 JW Eindhoven, Netherlands

来源：

PLASMA SOURCES SCIENCE & TECHNOLOGY | 2020年 / 29卷 / 06期

关键词：

plasma-assisted contamination control; complex plasma; spatial afterglow; particle charge control; COMPLEX; LIQUID;

D O I：

10.1088/1361-6595/ab8e4f

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

In this work, charge control of micro-particles from similar to-40 to +10 elementary charges is presented. This is achieved at 0.9 mbar argon in the spatial afterglow of an inductively coupled plasma by solely changing the strength of an externally applied electric field. Crucial in the presented experiments is the use of a grounded mesh grid in the cross section of the setup, separating the active plasma region from the 'shielded'spatial afterglow. While in the regions above the mesh grid all particles reached a constant negative equilibrium charge, the actual control achieved in the shielded spatial afterglow can most probably be explained by variations of the local ion density. The achieved charge control not only opens up possibilities to study nano-scale surface charging physics on micro-meter length scales, it also contributes to the further development of plasma-based contamination control for ultra-clean low-pressure systems.

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