Structure and mechanical properties of reactive and non-reactive sputter deposited WC based coatings

被引:14
作者
Glechner, T. [1 ]
Hahn, R. [1 ]
Zauner, L. [1 ]
Risslegger, S. [1 ]
Kirnbauer, A. [1 ]
Polcik, P. [2 ]
Riedl, H. [1 ]
机构
[1] TU Wien, Inst Mat Sci & Technol, A-1060 Vienna, Austria
[2] Plansee Composite Mat GmbH, D-86983 Lechbruck, Germany
关键词
Thin films; Magnetron sputtering; Crystal structure; Tungsten carbide; Carbon bonding; THIN-FILMS; NANOCRYSTALLINE WC; CARBON-FILMS; CORE-LEVEL; HARDNESS; TUNGSTEN; DIAMOND; MODULUS; DENSITY; STRESS;
D O I
10.1016/j.jallcom.2021.161129
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
During the growth of WC based thin films, carbon can be introduced by either a non-reactive or reactive deposition route. In this study, we compare the influence of the carbon origin on the coating properties, sputtering three different target materials - a ceramic WC, a ceramic WC including a conventional cobalt binder, and a metallic tungsten (W) target - in reactive (acetylene, C2H2) as well as non-reactive (pure Ar) atmospheres. The morphology changes, independently to the target type and atmosphere used, from crystalline (hex-W2C rich to pure fcc-WCx) to a nanocomposite (fcc-WCx nanometre sized grains embedded in an amorphous matrix) structure, up to amorphous coatings, only dominated by the prevalent C/W ratio. The cobalt binder however leads to a preferred amorphization of the coatings. The highest hardness is obtained for predominantly fcc structured WC0.67 (WC ceramic target), H = 40 +/- 1.7 GPa, exhibiting also an excellent intrinsic fracture toughness of K-IC = 3.3 +/- 0.33 MPa center dot m(1/2) obtained by micro-mechanical testing. Furthermore, the bonding nature of carbon is distinctly affected by the reactive carbon source, leading to more pronounced pi-bonded carbon peak with increasing C2H2/Ar flow rates. (C) 2021 The Authors. Published by Elsevier B.V. CC_BY_4.0.
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页数:9
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