Josephson junctions of Weyl and multi-Weyl semimetals

被引:22
|
作者
Kulikov, Kirill [1 ]
Sinha, Debabrata [2 ]
Shukrinov, Yu. M. [1 ,3 ]
Sengupta, K. [4 ]
机构
[1] Joint Inst Nucl Res, BLTP, Dubna 141980, Moscow Region, Russia
[2] Indian Inst Technol, Ctr Theoret Studies, Kharagpur 721302, W Bengal, India
[3] Dubna State Univ, Dept Nanotechnol & New Mat, Dubna, Moscow Region, Russia
[4] Indian Assoc Cultivat Sci, Sch Phys Sci, Kolkata 700032, India
关键词
TOPOLOGICAL-INSULATOR; TRANSPORT; MICROWAVES; CURRENTS; PHASE;
D O I
10.1103/PhysRevB.101.075110
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We study a Josephson junction involving a Weyl and a multi-Weyl semimetal separated by a barrier region of width d created by putting a gate voltage U-0 over the Weyl semimetal. The topological winding number of such a junction changes across the barrier. We show that IcRN for such junctions, where I-c is the critical current and R-N the normal-state resistance, in the thin-barrier limit, has a universal value independent of the barrier potential. We provide an analytical expression of the Andreev bound states and use it to demonstrate that the universal value of IcRN is a consequence of change in topological winding number across the junction. We also study the AC Josephson effect in such a junction in the presence of an external microwave radiation, chart out its current-voltage characteristics, and show that the change in the winding number across the junction shapes the properties of its Shapiro steps. We discuss the effect of increasing barrier thickness d on the above-mentioned properties and chart-out experiments which may test our theory.
引用
收藏
页数:10
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