Simultaneous observation of surface topography and elasticity at atomic scale by multifrequency frequency modulation atomic force microscopy

被引:22
作者
Naitoh, Yoshitaka [1 ]
Ma, Zongmin [1 ]
Li, Yan Jun [1 ]
Kageshima, Masami [1 ]
Sugawara, Yasuhiro [1 ]
机构
[1] Osaka Univ, Dept Appl Phys, Grad Sch Engn, Suita, Osaka 5650871, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2010年 / 28卷 / 06期
关键词
STRESS; SI(100); SI(001); STEPS;
D O I
10.1116/1.3503611
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The authors integrated the frequency modulation (FM) technique into multifrequency atomic force microscopy (AFM). Based on theoretical considerations, simultaneous excitation of the cantilever oscillation at the first and second flexural modes allows us to acquire the surface topography and surface elasticity simultaneously. The authors performed multifrequency FM-AFM observation using a tungsten-coated silicon cantilever on a Ge(001) surface exhibiting a dimer structure at room temperature. The topography and the elasticity of the surface were successfully obtained at the atomic scale. The authors found that the dimer atoms around a missing dimer defect have higher elasticity than the other dimer atoms. This suggests that stiffer atomic bonding of the dimer atoms occurred as a result of the additional tensile strain field from the defect. Therefore, the multifrequency FM-AFM described in the present study is expected to be useful for the investigation of the surface elasticity at the atomic scale. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3503611]
引用
收藏
页码:1210 / 1214
页数:5
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