Direct measurement of the spatial extent of the in situ developed latent image by neutron reflectivity

被引：5

作者：

Prabhu, Vivek M. ^{[1
]}

Vogt, Bryan D. ^{[1
]}

Kang, Shuhui ^{[1
]}

Rao, Ashwin ^{[1
]}

Lin, Eric K. ^{[1
]}

Satija, Sushil K. ^{[2
]}

机构：

[1] NIST, Div Polymers, Gaithersburg, MD 20899 USA

[2] NIST, Ctr Neutron Res, Gaithersburg, MD 20899 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2007年 / 25卷 / 06期

关键词：

D O I：

10.1116/1.2800329

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The spatial distribution of polymer photoresist and deuterium labeled base developer highlights a fraction of the line edge that swells but does not dissolve. This residual swelling fraction remains swollen during both the in situ aqueous hydroxide dissolution (development) and water rinse steps uncovering that the final lithographic feature is resolved by a collapse mechanism during the drying step. These new insights into the mechanism of lithographic feature formation were enabled by contrast variant neutron reflectivity methods with nanometer resolution.

引用

页码：2514 / 2520

页数：7

共 8 条

[1] Direct measurement of the in situ developed latent image: The residual swelling fraction
Prabhu, Vivek M.
Vogt, Bryan D.
Kang, Shuhui
Rao, Ashwin
Lin, Eric K.
Satija, Sushil K.
Turnquest, Karen
ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIV, 2007, 6519
[2] A DIRECT OPTICAL MEASUREMENT OF LATENT-IMAGE FORMATION
URBACH, F
NAIL, NR
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1953, 43 (04) : 336 - 336
[3] Lateral length scales of latent image roughness as determined by off-specular neutron reflectivity
Lavery, Kristopher A.
Prabhu, Vivek M.
Lin, Eric K.
Wu, Wen-li
Satija, Sushil K.
Choi, Kwang-Woo
Wormington, Matthew
APPLIED PHYSICS LETTERS, 2008, 92 (06)
[4] ABSENCE OF LATENT IMAGE FADING BY DIRECT QUANTITATIVE AUTORADIOGRAPHIC MEASUREMENT
BOREN, HG
WRIGHT, EC
HARRIS, CC
JOURNAL OF CELL BIOLOGY, 1973, 59 (02): : A31 - A31
[5] Neutron Reflectivity Characterization of the Photoacid Reaction-Diffusion Latent and Developed Images of Molecular Resists for Extreme Ultraviolet Lithography
Prabhu, Vivek M.
Kang, Shuhui
Sha, Jing
Bonnesen, Peter V.
Satija, Sushil
Wu, Wen-li
Ober, Christopher K.
LANGMUIR, 2012, 28 (20) : 7665 - 7678
[6] A novel in-situ roughness measurement based on spatial average analysis of binary speckle image
Hsu, Kuo Chan
Fuh, Yiin Kuen
MATERIALS PROCESSING TECHNOLOGIES, PTS 1 AND 2, 2011, 154-155 : 1125 - 1130
[7] Prediction of measurement error due to low gray scale and spatial resolution of an imaging system on quantification of neutron radiographic image
Hibiki, T
Mishima, K
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1997, 388 (1-2): : 204 - 211
[8] Measurement of mid-spatial frequency scatter in extreme ultraviolet lithography systems using direct aerial image measurements
Fields, CH
RayChaudhuri, AK
Krenz, KD
Oldham, WG
Stulen, RH
EMERGING LITHOGRAPHIC TECHNOLOGIES, 1997, 3048 : 356 - 367

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