Influence of Mg doping on structural defects in AlGaN layers grown by metalorganic chemical vapor deposition

被引:20
作者
Cho, HK
Lee, JY
Jeon, SR
Yang, GM
机构
[1] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
[2] Chonbuk Natl Univ, Dept Semicond Sci & Technol, Duckjin Dong 561756, Chunju, South Korea
[3] Chonbuk Natl Univ, Semicond Phys Res Ctr, Duckjin Dong 561756, Chunju, South Korea
关键词
D O I
10.1063/1.1424471
中图分类号
O59 [应用物理学];
学科分类号
摘要
Influence of Mg doping on structural defects in Al0.13Ga0.87N layers grown on sapphire substrates by metalorganic chemical vapor deposition were studied using transmission electron microscopy. By increasing the Mg source flow rate, the reduction of dislocation density occurred up to the Mg source flow rate of 0.103 mu mol/min. While the vertical type inversion domain boundaries (IDBs) were observed in the Al0.13Ga0.87N layers grown with the low Mg source flow rate, the IDBs in the Al0.13Ga0.87N layers grown with the high Mg source flow rate have horizontally multifaceted shapes. The change of polarity by the IDBs of horizontal type also resulted in the 180 degrees rotation of pyramidal defects within the same AlGaN layer. (C) 2001 American Institute of Physics.
引用
收藏
页码:3788 / 3790
页数:3
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