Formation and direct writing of color centers in LiF using a laser-induced extreme ultraviolet plasma in combination with a Schwarzschild objective

被引:34
作者
Barkusky, F
Peth, C
Mann, K
Feigl, T
Kaiser, N
机构
[1] Laser Lab Gottingen eV, D-37077 Gottingen, Germany
[2] Fraunhofer Inst Angew Opt & Feinmech, D-07745 Jena, Germany
关键词
D O I
10.1063/1.2072147
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
In order to generate high-energy densities of 13.5 nm radiation, an extreme ultraviolet (EUV) Schwarzschild mirror objective with a numerical aperture of 0.44 and a demagnification of 10 was developed and adapted to a compact laser-based EUV source. The annular spherical mirror substrates were coated with Mo/Si multilayer systems. With a single mirror reflectance of more than 65% the total transmittance of the Schwarzschild objective exceeds 40% at 13.5 nm. From the properties of the EUV source (pulse energy 3 mJ at 13.5 nm and plasma diameter approximately 300 mu m), energy densities of 73 mJ/cm(2) at a pulse length of 6 ns can be estimated in the image plane of the objective. As a first application, the formation of color centers in lithium fluoride crystals by EUV radiation was investigated. F-2, F-3, and F-3(+) color centers could be identified by absorption spectroscopy. The formation dynamics was studied as a function of the EUV dose. By imaging of a pinhole positioned behind the plasma, an EUV spot of 5 mu m diameter was generated, which accomplishes direct writing of color centers with micrometer resolution. (c) 2005 American Institute of Physics.
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页码:1 / 5
页数:5
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