Effects of plasma nitriding and TiN coating duplex treatment on wear resistance of commercially pure titanium

被引：6

作者：

Tong Yu ^{[1
,2
]}

Guo Tian-Wen ^{[1
]}

Wang Jing ^{[1
]}

Liang Hai-Feng ^{[3
]}

Mi Qian ^{[3
]}

机构：

[1] Fourth Mil Med Univ, Dept Prosthodont, Sch Stomatol, Xian 710032, Peoples R China

[2] Hangzhou Aeromedicine Evaluat & Training Ctr AF, Dept Stomatol, Hangzhou, Peoples R China

[3] Xian Technol Univ, Shaanxi Prov Key Lab Thin Film Technol & Opt Dete, Xian, Peoples R China

来源：

HIGH PERFORMANCE STRUCTURES AND MATERIALS ENGINEERING, PTS 1 AND 2 | 2011年 / 217-218卷

关键词：

Titanium nitride (TiN); Plasma nitriding; Friction coefficient; Wear resistance; DEPOSITION; ALLOYS;

D O I：

10.4028/www.scientific.net/AMR.217-218.1050

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

The commercially pure(CP) titanium specimens were modified with Direct current(DC) plasma nitriding and arc ion plating of TiN film. The duplex treated titanium samples were characterized by scanning electron microscopy(SEM), microhardness tester and ball-on-disc tribotester. The results showed that the duplex treated CP titanium appeared uniform and bright golden, microhardness and wear resistance improved substantially and were superior to that of only TiN coated ones. All these results indicate plasma nitriding and TiN film deposition duplex treatment can improve surface characteristics of CP titanium significantly. The method can be applied to the titanium denture to improve the tribological properties and color.

引用

页码：1050 / +

页数：2

共 11 条

[1]

[Anonymous], 2006, J PROSTHET DENT, DOI DOI 10.1016/J.PR0SDENT.2006.02.020

[2] Ti based biomaterials, the ultimate choice for orthopaedic implants - A review [J].

Geetha, M. ;

Singh, A. K. ;

Asokamani, R. ;

Gogia, A. K. .

PROGRESS IN MATERIALS SCIENCE, 2009, 54 (03) :397-425

[3]

JOHNSON PC, 1989, CONT PREPARATIVE TEC, P129

[4] Influence of deposition pressure on the structural mechanical and decorative properties of TiN thin films deposited by cathodic arc evaporation [J].

Lousa, A. ;

Esteve, J. ;

Mejia, J. P. ;

Devia, A. .

VACUUM, 2007, 81 (11-12) :1507-1510

[5]

Musil H., 1993, MECH DIELECTRIC PROP, P79

[6] Sliding wear of titanium nitride thin films deposited on Ti-6Al-4V alloy by PVD and plasma nitriding processes [J].

Nolan, D ;

Huang, SW ;

Leskovsek, V ;

Braun, S .

SURFACE & COATINGS TECHNOLOGY, 2006, 200 (20-21) :5698-5705

[7] EXCITATION, IONIZATION, AND REACTION-MECHANISM OF A REACTIVE CATHODIC ARE DEPOSITION OF TIN [J].

SAKAKI, M ;

SAKAKIBARA, T .

IEEE TRANSACTIONS ON PLASMA SCIENCE, 1994, 22 (06) :1049-1054

[8] Gas nitriding - Process control and nitriding non-ferrous alloys [J].

Spies, HJ ;

Reinhold, B ;

Wilsdorf, K .

SURFACE ENGINEERING, 2001, 17 (01) :41-54

[9] Corrosion behavior and surface characterization of titanium in solution containing fluoride and albumin [J].

Takemoto, S ;

Hattori, M ;

Yoshinari, M ;

Kawada, E ;

Oda, Y .

BIOMATERIALS, 2005, 26 (08) :829-837

[10] The properties of TiN thin films deposited by pulsed direct current magnetron sputtering [J].

Yeh, Tung-Sheng ;

Wu, Jenn-Ming ;

Hu, Long-Jang .

THIN SOLID FILMS, 2008, 516 (21) :7294-7298

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