Growth of BaSi2 film on Ge(100) by vacuum evaporation and its photoresponse properties

被引:6
作者
Cham Thi Trinh [1 ,4 ]
Nakagawa, Yoshihiko [1 ]
Hara, Kosuke O. [2 ]
Kurokawa, Yasuyoshi [1 ]
Takabe, Ryota [3 ]
Suemasu, Takashi [3 ]
Usami, Noritaka [1 ]
机构
[1] Nagoya Univ, Grad Sch Engn, Nagoya, Aichi 4648603, Japan
[2] Univ Yamanashi, Ctr Crystal Sci & Technol, Kofu, Yamanashi 4008511, Japan
[3] Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
[4] Helmholtz Zentrum Berlin Mat & Energy, Inst Silicon Photovolta, D-12489 Berlin, Germany
基金
日本科学技术振兴机构;
关键词
MOLECULAR-BEAM EPITAXY; SOLAR-CELL APPLICATIONS; THIN-FILMS; SEMICONDUCTING SILICIDES; BA1-XSRXSI2; SI;
D O I
10.7567/JJAP.56.05DB06
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have successfully grown a polycrystalline orthorhombic BaSi2 film on a Ge(100) substrate by an evaporation method. Deposition of an amorphous Si (a-Si) film on the Ge substrate prior to BaSi2 evaporation plays a critical role in obtaining a high-quality BaSi2 film. By controlling substrate temperature and the thickness of the a-Si film, a crack-free and single-phase polycrystalline orthorhombic BaSi2 film with a long carrier lifetime of 1.5 mu s was obtained on Ge substrates. The photoresponse property of the ITO/BaSi2/Ge/Al structure was clearly observed, and photoresponsivity was found to increase with increasing substrate temperature during deposition of a-Si. Furthermore, the BaSi2 film grown on Ge showed a higher photoresponsivity than that grown on Si, indicating the potential application of evaporated BaSi2 on Ge to thin-film solar cells. (c) 2017 The Japan Society of Applied Physics
引用
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页数:6
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