Focused ion beam-nanomachined probes for improved electric force microscopy

被引：19
作者：
Menozzi, C [1 ]
Gazzadi, GC [1 ]
Alessandrini, A [1 ]
Facci, P [1 ]
机构：
[1] INFM, Natl Res Ctr S3, I-41100 Modena, Italy
来源：
ULTRAMICROSCOPY | 2005年 / 104卷 / 3-4期
关键词：
atomic force microscopy; focused ion beam; electric force microscopy; force volume;
D O I：
10.1016/j.ultramic.2005.04.004
中图分类号：
TH742 [显微镜];
学科分类号：
摘要：
Nanomachining and beam-assisted Pt deposition by a focused ion beam (FIB) was used to modify AFM probes for improved electric force measurements.. Si3N4 cantilevers have been endowed with a nano-electrode at the tip apex to confine the electro-sensitive area at the very tip. This action results in both a marked decrease of the parasitic capacitive effect and in an improved electric force microscopy (EFM) contrast and resolution, with respect to usual, full metal-coated cantilevers. This fabrication approach is suited to the development of innovative electro-sensitive probes, useful in different scanning probe techniques. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：220 / 225
页数：6
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