Size dependence of the 2p-level shift of nanosolid silicon

被引:46
作者
Sun, CQ [1 ]
Pan, LK [1 ]
Fu, YQ [1 ]
Tay, BK [1 ]
Li, S [1 ]
机构
[1] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore
关键词
D O I
10.1021/jp0272015
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Modeling exercises on the size-induced blue-shift in the photoluminescence (PL) of nanosolid Si (J. Phys. Chem. B 2002, 106, 11725) have been extended herewith to the size dependence of the Si-2p energy-level-shift measured using X-ray photoelectron spectroscopy (XPS). Results show consistency in both the origin and trend of the core-level shift with that of band-gap expansion upon Si nanosolid formation. Most strikingly, decoding the size dependent XPS peak shift leads to quantitative information about the 2p-level atomic trapping energy of an isolated Si atom (-96.74 eV) and the crystal binding intensity (-2.46 eV) upon bulk solid formation, which is beyond the scope of direct measurement using currently available techniques.
引用
收藏
页码:5113 / 5115
页数:3
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