Amorphous-Nanocrystalline Silicon Plasma Enhanced CVD Grown on Porous Alumina Substrate

被引：0
|
作者：
Khodin, A. [1 ]
Joong-Kee, Lee [1 ]
Chang-Sam, Kim [1 ]
Sang-Ok, Kim [1 ]
机构：
[1] Korea Inst Sci & Technol, Battery Res Ctr, Seoul, South Korea
来源：
2009 9TH IEEE CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO) | 2009年
关键词：
amorphous silicon; thin film; CVD; alumina; nanocrystals; composite material; MICROCRYSTALLINE SILICON; SOLAR-CELLS; FILMS; NANOWIRES; MECHANISM; PHASE;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The novel composite amorphous/nanocrystalline thin-film silicon has been fabricated by plasma-enhanced CVD using template porous alumina substrate. The layers possess of specific non-planar morphology and contain silicon nanocrystals of 2 - 4 nm diameter, as well as "bunches" of elongated nanocrystals composing honeycomb-like net. The results obtained could be used in new composite materials and structures for photovoltaics, photonics and ionics.
引用
收藏
页码：540 / 542
页数：3
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