Stress Relaxation Mechanisms of Sn and SnPb Coatings Electrodeposited on Cu: Avoidance of Whiskering

被引:26
作者
Sobiech, M. [1 ,2 ,3 ]
Teufel, J. [1 ,2 ,4 ]
Welzel, U. [1 ,2 ]
Mittemeijer, E. J. [1 ,2 ,4 ]
Huegel, W. [3 ]
机构
[1] Max Planck Inst Intelligent Syst, D-70569 Stuttgart, Germany
[2] Max Planck Inst Met Res, D-70569 Stuttgart, Germany
[3] Robert Bosch GmbH, D-72770 Reutlingen, Germany
[4] Univ Stuttgart, Inst Mat Sci, D-70569 Stuttgart, Germany
关键词
Sn whisker; x-ray diffraction; residual stresses; creep; GRAIN-BOUNDARY; THIN-FILMS; TIN; GROWTH; GRADIENTS; SUBSTRATE; PROFILES; HILLOCK; LEAD; AL;
D O I
10.1007/s11664-011-1737-3
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The interrelations of microstructural evolution, phase formation, residual stress development, and whiskering behavior were investigated for the systems of Sn coating on Cu and SnPb coating on Cu during aging at room temperature. It was shown that the whisker-preventing effect of Pb addition to pure Sn can be attributed to a Pb-induced change of the stress relaxation mechanism in the coating: Pure Sn coatings, with a columnar grain morphology, relax mechanical stress via localized, unidirectional grain growth from the surface of the coating (i.e., whisker formation occurs), whereas SnPb coatings, with an equiaxed grain morphology, relax mechanical stress via uniform grain coarsening without whisker formation. It can thus be suggested that tuning of the Sn grain morphology (i.e., establishing an equiaxed grain morphology) is a straightforward method of microstructural control to suppress whisker formation at room temperature. Experimental results obtained in this project validate this conclusion.
引用
收藏
页码:2300 / 2313
页数:14
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