Periodically structured metallic substrates for SERS

被引：258
作者：
Kahl, M
Voges, E
Kostrewa, S
Viets, C
Hill, W
机构：
[1] Univ Dortmund, Lehrstuhl Hochfrequenztech, D-44221 Dortmund, Germany
[2] Inst Spektrochem & Angew Spektroskopie, D-44013 Dortmund, Germany
来源：
SENSORS AND ACTUATORS B-CHEMICAL | 1998年 / 51卷 / 1-3期
关键词：
surface-enhanced Raman scattering (SERS); periodical metallic substrates; E-beam lithography; reactive ion etching; lift-off technique;
D O I：
10.1016/S0925-4005(98)00219-6
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
The detection of organic traces by surface-enhanced Raman scattering (SERS) requires rough metallic substrates with structures in the nanometer range. Regular metallic structures generated by electron-beam lithography are better reproducible than electrochemical roughened surfaces, island films or films over deposited particles. The lithography also allows optimisation of the dimensions of these structures. The SERS enhancement of optimised periodic structures was found to be at least one order of magnitude larger than that of island films. (C) 1998 Elsevier Science S.A. All fights reserved.
引用
收藏
页码：285 / 291
页数：7
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