Electronic structure of TiS2 and its electric transport properties under high pressure

被引:40
|
作者
Liu, Bao [1 ]
Yang, Jie [1 ,2 ]
Han, Yonghao [1 ]
Hu, Tingjing [1 ]
Ren, Wanbin [1 ]
Liu, Cailong [1 ]
Ma, Yanzhang [1 ,3 ]
Gao, Chunxiao [1 ]
机构
[1] Jilin Univ, State Key Lab Superhard Mat, Changchun 130012, Peoples R China
[2] Aviat Univ AF, Fundamental Dept, Changchun 130022, Peoples R China
[3] Texas Tech Univ, Dept Mech Engn, Lubbock, TX 79409 USA
基金
中国国家自然科学基金;
关键词
TRANSITION-METAL DICHALCOGENIDES; ANGLE-RESOLVED PHOTOEMISSION; X-RAY-ABSORPTION; SEMIMETAL TRANSITION; TITANIUM DISULFIDE; BAND-STRUCTURE; INTERCALATION; SEMICONDUCTOR; SPECTRA; 1T-TIS2;
D O I
10.1063/1.3552299
中图分类号
O59 [应用物理学];
学科分类号
摘要
The electronic structure of TiS2 and its transport properties under high pressure have been studied using first-principles calculation and in situ transport parameters measurement. Both the theoretical and experimental results support the conclusion that TiS2 is a semimetal rather than a semiconductor and maintains its semimetallic behavior under high pressure. Although there is no significant change in density of state at Fermi level up to 20 GPa, the transport behavior change drastically at around 15 GPa, manifested by the change in the slope of resistivity and electronic concentration versus pressure curves. This pressure response of transport properties of TiS2 may be associated with conduction of pressure-induced ionization of impurity levels. (C) 2011 American Institute of Physics. [doi:10.1063/1.3552299]
引用
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页数:5
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