One-dimensional Si-in-Si(001) template for single-atom wire growth

被引:11
作者
Owen, J. H. G. [1 ]
Bianco, F. [1 ]
Koester, S. A. [1 ]
Mazur, D. [1 ]
Bowler, D. R. [2 ,3 ]
Renner, Ch. [1 ]
机构
[1] Univ Geneva, Dept Condensed Matter Phys, NCCR MaNEP, CH-1211 Geneva 4, Switzerland
[2] UCL, Dept Phys & Astron, London WC1E 6BT, England
[3] London Ctr Nanotechnol, London WC1H 0AH, England
基金
瑞士国家科学基金会;
关键词
SURFACES; NANOSTRUCTURES; SI(001); NANOWIRES; INDIUM;
D O I
10.1063/1.3483164
中图分类号
O59 [应用物理学];
学科分类号
摘要
Single atom metallic wires of arbitrary length are of immense technological and scientific interest. We present atomic-resolution scanning tunneling microscope data of a silicon-only template, which modeling predicts to enable the self-organized growth of isolated micrometer long surface and subsurface single-atom chains. It consists of a one-dimensional, defect-free Si reconstruction four dimers wide the Haiku core-formed by hydrogenation of self-assembled Bi-nanolines on Si(001) terraces, independent of any step edges. We discuss the potential of this Si-in-Si template as an appealing alternative to,vicinal surfaces for nanoscale patterning. (C) 2010 American Institute of Physics. [doi:10.1063/1.3483164]
引用
收藏
页数:3
相关论文
共 22 条
[1]   Metal-insulator transition in Au atomic chains on Si with two proximal bands [J].
Ahn, JR ;
Yeom, HW ;
Yoon, HS ;
Lyo, IW .
PHYSICAL REVIEW LETTERS, 2003, 91 (19)
[2]   Engineering atomic and molecular nanostructures at surfaces [J].
Barth, JV ;
Costantini, G ;
Kern, K .
NATURE, 2005, 437 (7059) :671-679
[3]   Fractional band filling in an atomic chain structure [J].
Crain, JN ;
Kirakosian, A ;
Altmann, KN ;
Bromberger, C ;
Erwin, SC ;
McChesney, JL ;
Lin, JL ;
Himpsel, FJ .
PHYSICAL REVIEW LETTERS, 2003, 90 (17) :4-176805
[4]  
GIAMARCHI T, 2004, QUANTUM PHYS ONE DIM, pCH2
[5]   Self-organized, one-dimensional Pt nanowires on Ge(001) [J].
Gurlu, O ;
Adam, OAO ;
Zandvliet, HJW ;
Poelsema, B .
APPLIED PHYSICS LETTERS, 2003, 83 (22) :4610-4612
[6]   Scanning tunneling microscope based fabrication of nano- and atomic scale dopant devices in silicon: The crucial step of hydrogen removal [J].
Hallam, T. ;
Reusch, T. C. G. ;
Oberbeck, L. ;
Curson, N. J. ;
Simmons, M. Y. .
JOURNAL OF APPLIED PHYSICS, 2007, 101 (03)
[7]   Atomic-level study of the robustness of the Si(100)-2x1:H surface following exposure to ambient conditions [J].
Hersam, MC ;
Guisinger, NP ;
Lyding, JW ;
Thompson, DS ;
Moore, JS .
APPLIED PHYSICS LETTERS, 2001, 78 (07) :886-888
[8]   Spin coupling in engineered atomic structures [J].
Hirjibehedin, CF ;
Lutz, CP ;
Heinrich, AJ .
SCIENCE, 2006, 312 (5776) :1021-1024
[9]   Growth of noble metal nanostructures on the Bi nanoline surface: A first-principles study [J].
Koga, H. ;
Ohno, T. .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2007, 140 (03) :160-165
[10]   NANOMETER-SCALE PATTERNING AND OXIDATION OF SILICON SURFACES WITH AN ULTRAHIGH-VACUUM SCANNING TUNNELING MICROSCOPE [J].
LYDING, JW ;
ABELN, GC ;
SHEN, TC ;
WANG, C ;
TUCKER, JR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (06) :3735-3740