Photoreactivity of diarylnitrone additive/pendant in poly(methyl methacrylate) film and photocontrol of refractive index for this polymer film

被引：7

作者：

Tanaka, K

Shiraishi, H

Takayanagi, E

Korechika, A

Igarashi, T

Sakurai, T ^{[1
]}

机构：

[1] Kanagawa Univ, Fac Engn, Dept Appl Chem, Kanagawa Ku, Yokohama, Kanagawa 2218686, Japan

[2] Kanagawa Univ, High Tech Res Ctr, Kanagawa Ku, Yokohama, Kanagawa 2218686, Japan

来源：

JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY | 2005年 / 174卷 / 03期

关键词：

diarylnitrone; photoreactivity; polymer film; refractive index; photocontrol;

D O I：

10.1016/j.jphotochem.2005.03.008

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Photoreactivities of hydroxy-substituted diarylnitrones (1a-f) in solution and methyl methacrylate(MMA)-derived polymer film were studied. The methyl group introduced at the ortho-position on the N-aryl benzene ring of 1 (1c-e) was found to exert a great steric effect on the photoreaction pathway to eventually give a different photoproduct distribution. This steric effect also contributed to suppressing a decrease in the refractive index of PMMA polymer film. The irradiation at 366 nm of MMA-derived copolymer film (bearing the diarylnitrone pendants) lowered the refractive index of this film by - Delta n = 0.0152, which was much larger than the refractive-index decrease of PMMA polymer film containing 1c-e as additives (- Delta n = 0.0017-0.0044). (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：199 / 206

页数：8

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