Nitride-based near-ultraviolet LEDs with an ITO transparent contact

被引:58
作者
Kuo, CH
Chang, SJ [1 ]
Su, Y
Chuang, RW
Chang, CS
Wu, LW
Lai, WC
Chen, JF
Sheu, J
Lo, HM
Tsai, JM
机构
[1] Natl Cheng Kung Univ, Inst Microelect, Tainan 70101, Taiwan
[2] Natl Cheng Kung Univ, Dept Elect Engn, Tainan 70101, Taiwan
[3] Natl Cent Univ, Ctr Opt Sci, Chungli 320, Taiwan
[4] S Epitaxy Corp, Tainan, Taiwan
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2004年 / 106卷 / 01期
关键词
ITO; In0.05Ga0.95N/Al0.1Ga0.9N LED; short-period superlattice (SPS);
D O I
10.1016/j.mseb.2003.09.018
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Indium tin oxide (ITO) (2300 nm) and Ni (5 nm)/Au (10 nm) films were deposited onto glass substrates, p-GaN layers, n(=)-InGaN/GaN short-period-superlattice (SPS) structures and near-ultraviolet (near-UV) In0.05Ga0.95N/Al0.1Ga0.9N light emitting diodes (LEDs). It was found that ITO on n(+)-SPS structure could provide us an extremely high transparency (i.e. 86.5% at 400nm) and a reasonably small 1.2 x 10(-3) Omega cm(2) specific contact resistance. It was also found that, at 20 mA, the forward voltage of the near-UV LED with ITO on n(+)-SPS upper contact was 3.13 V, which is exactly the same as that of the near-UV LED with Ni/Au on n(+)-SPS upper contact. Furthermore, it was found that we could achieve a 36% larger output power by using such an ITO on n(+)-SPS upper contact. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:69 / 72
页数:4
相关论文
共 20 条
  • [1] Crystal growth and conductivity control of group III nitride semiconductors and their application to short wavelength light emitters
    Akasaki, I
    Amano, H
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1997, 36 (9A): : 5393 - 5408
  • [2] GaN metal-semiconductor-metal photodetectors with low-temperature-GaN cap layers and ITO metal contacts
    Chang, SJ
    Lee, ML
    Sheu, JK
    Lai, WC
    Su, YK
    Chang, CS
    Kao, CJ
    Chi, GC
    Tsai, JA
    [J]. IEEE ELECTRON DEVICE LETTERS, 2003, 24 (04) : 212 - 214
  • [3] Improved ESD protection by combining InGaN-GaN MQW LEDs with GaN Schottky diodes
    Chang, SJ
    Chen, CH
    Su, YK
    Sheu, JK
    Lai, WC
    Tsai, JM
    Liu, CH
    Chen, SC
    [J]. IEEE ELECTRON DEVICE LETTERS, 2003, 24 (03) : 129 - 131
  • [4] Si and Zn co-doped InGaN-GaN white light-emitting diodes
    Chang, SJ
    Wu, LW
    Su, YK
    Kuo, CH
    Lai, WC
    Hsu, YP
    Sheu, JK
    Chen, SF
    Tsai, JM
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2003, 50 (02) : 519 - 521
  • [5] InGaN-GaN multiquantum-well blue and green light-emitting diodes
    Chang, SJ
    Lai, WC
    Su, YK
    Chen, JF
    Liu, CH
    Liaw, UH
    [J]. IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 2002, 8 (02) : 278 - 283
  • [6] 400-nm InGaN-GaN and InGaN-AlGaN multiquantum well light-emitting diodes
    Chang, SJ
    Kuo, CH
    Su, YK
    Wu, LW
    Sheu, JK
    Wen, TC
    Lai, WC
    Chen, JF
    Tsai, JM
    [J]. IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 2002, 8 (04) : 744 - 748
  • [7] Nitride-based cascade near white light-emitting diodes
    Chen, CH
    Chang, SJ
    Su, YK
    Sheu, JK
    Chen, JF
    Kuo, CH
    Lin, YC
    [J]. IEEE PHOTONICS TECHNOLOGY LETTERS, 2002, 14 (07) : 908 - 910
  • [8] High-efficiency InGaN-GaN MQW green light-emitting diodes with CART and DBR structures
    Chen, CH
    Chang, SJ
    Su, YK
    Chi, GC
    Sheu, JK
    Chen, JF
    [J]. IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 2002, 8 (02) : 284 - 288
  • [9] Indium tin oxide transparent electrodes for broad-area top-emitting vertical-cavity lasers fabricated using a single lithography step
    Chua, CL
    Thornton, RL
    Treat, DW
    Yang, VK
    Dunnrowicz, CC
    [J]. IEEE PHOTONICS TECHNOLOGY LETTERS, 1997, 9 (05) : 551 - 553
  • [10] Nitride-based light emitting diodes with Si-doped In0.23Ga0.77N/GaN short-period superlattice tunneling contact layer
    Kuo, CH
    Chang, SJ
    Su, YK
    Wu, LW
    Chen, JF
    Shen, JK
    Tsai, JM
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2003, 50 (02) : 535 - 537