The influence of tantalum content in relation to substrate temperature on magnetic and structural properties of Co-Cr-Ta thin films

被引：7
作者：
Le Kim, P
Lodder, C
Luong, NH
Hien, TD
机构：
[1] Int Training Inst Mat Sci, Hanoi, Vietnam
[2] Univ Twente, ISTG, MESA Res Inst, NL-7500 AE Enschede, Netherlands
[3] Univ Hanoi, Fac Phys, Cryogen Lab, Hanoi, Vietnam
来源：
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1999年 / 193卷 / 1-3期
关键词：
thin films; substrate temperature; tantalum; RF-sputtering;
D O I：
10.1016/S0304-8853(98)00412-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In this study, we investigated the influence of Ta content (in Co86Cr12Ta2 and Co82Cr13Ta5 compositions) on magnetic and structural properties of Co-Cr-Ta perpendicular media samples grown on Si substrates at different substrate temperatures during RF-sputter deposition. In general, coercivity of Co82Cr13Ta5 samples is higher than that of Co86Cr12Ta2 samples, whereas the perpendicular c-axis orientation of Co86Cr12Ta2 samples is better. Ta content was suggested to be in between 2 and 5 at% to give optimum magnetic and structural properties. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：117 / 120
页数：4
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