The microstructure and state of stress of sn thin films after post-plating annealing:: An explanation for the suppression of whisker formation?

The post-plating annealing ('post-bake' treatment, annealing at 150 degrees C for 1 h) of pure matte Sri thin films on Cubased substrates is known to be an effective whisker mitigation treatment. The microstructure and the stress state of Sri thin films on Cu-substrates produced with and without a 'post-bake' treatment have been investigated using scanning electron and focused ion beam microscopy (SEM & FIB), Xray photoelectron spectroscopy (XPS) and ageing time and depth-dependent X-ray diffraction (XRD) stress analyses. A comparison of the measured stress-depth gradients in t e near-surface regions of the Sri thin films produced with an without 'post-bake' treatment indicates differences that might provide a plausible explanation for the observed long-term resistance against whisker growth of Sn thin films subjected to a 'post-bake' treatment. In specimens subjected to a 'postbake' treatment, an almost depth-independent tensile stress state prevails in the surface region even after prolonged ageing.