Strain-induced interface instability in GaN/AlN multiple quantum wells

被引:37
作者
Nicolay, S. [1 ]
Feltin, E.
Carlin, J.-F.
Grandjean, N.
Nevou, L.
Julien, F. H.
Schmidbauer, M.
Remmele, T.
Albrecht, M.
机构
[1] Ecole Polytech Fed Lausanne, Inst Quantum Elect & Photon, CH-1015 Lausanne, Switzerland
[2] Univ Paris 11, CNRS, UMR 8622, OptoGaN Dept,Inst Elect Fondamentale, F-91405 Orsay, France
[3] Inst Kristallzuchtung, D-12489 Berlin, Germany
关键词
D O I
10.1063/1.2769399
中图分类号
O59 [应用物理学];
学科分类号
摘要
It is shown that in GaN/AlN multiple quantum wells (MQWs), strain is a critical parameter for achieving short-wavelength intersubband transitions (ISBTs). This is investigated by comparing GaN/AlN MQWs grown by metal organic vapor phase epitaxy on either AlN or GaN templates. The GaN/AlN interface is found to be unstable when pseudomorphically strained onto GaN, in agreement with theory. This effect deeply affects the quantum well potential profile leading to a strong redshift of the ISBT energies.
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页数:3
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