Nanostructured Cu/Nb multilayers subjected to helium ion-irradiation

被引:126
作者
Zhang, X. [1 ]
Li, Nan
Anderoglu, O.
Wang, H.
Swadener, J. G.
Hoechbauer, T.
Misra, A.
Hoagland, R. G.
机构
[1] Texas A&M Univ, Dept Mech Engn, College Stn, TX 77843 USA
[2] Texas A&M Univ, Dept Elect & Comp Engn, College Stn, TX 77843 USA
[3] Los Alamos Natl Lab, Div Mat Sci & Technol, Los Alamos, NM 87545 USA
[4] Los Alamos Natl Lab, Mat Phys & Applicat Div, Los Alamos, NM 87545 USA
关键词
ion radiation effects; nanocrystalline materials; structure and morphology (thickness; crystalline; orientation and texture); TEM;
D O I
10.1016/j.nimb.2007.03.098
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Helium ion-irradiation experiments have been performed in single layer Cu films, Nb films and Cu/Nb multilayer films with layer thickness varying from 2.5 nm to 100 nm each layer. Peak helium concentration approaches a few atomic percent with 6-9 displacement-per-atom in Cu and Nb. He bubbles were observed in single layer Cu and Nb films, as well as in Cu 100 nm/Nb 100 nm multilayers with helium bubbles aligned along layer interfaces. Helium bubbles are not resolved via transmission electron microscopy in Cu 2.5 nm/ Nb 2.5 nm multilayers. These studies indicate that layer interface may play an important role in annihilating ion-irradiation induced defects such as vacancies and interstitials and have implications in improving the radiation tolerance of metallic materials using nanostructured multilayers. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:1129 / 1132
页数:4
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