Visible photoluminescence from Si clusters in gamma-irradiated amorphous SiO2

被引:127
作者
Nishikawa, H
Watanabe, E
Ito, D
Sakurai, Y
Nagasawa, K
Ohki, Y
机构
[1] SHONAN INST TECHNOL,DEPT ELECT ENGN,FUJISAWA,KANAGAWA 251,JAPAN
[2] WASEDA UNIV,DEPT ELECT ELECT & COMP ENGN,SHINJUKU KU,TOKYO 169,JAPAN
关键词
D O I
10.1063/1.363223
中图分类号
O59 [应用物理学];
学科分类号
摘要
Visible photoluminescence (PL) bands around 2 eV were studied in Co-60 gamma-irradiated (dose<1 MGy) oxygen-deficient-type amorphous SiO2 (a-SiO2) excited by 2-4 eV photons. In addition to the well-known 1.9 eV PL band due to nonbridging oxygen hole centers, another PL band was observed at 2.2 eV when excited by 3.8 eV photons. The intensity of the 2.2 eV band increases with decreasing oxygen partial pressure during the sample preparation. Electron-spin-resonance measurements show that the intensity of the 2.2 eV band is correlated with the concentration of the E'(delta) center, a paramagnetic state of a cluster of silicons. After much higher gamma irradiation with a dose up to 10 MGy, a new PL band was induced at 1.75 eV under excitation by 2.5 eV photons, as well as the 1.9 and 2.2 eV PL bands. By comparing its spectral shape and excitation energy with known PL band in Si-implanted a-SiO2, it is suggested that the 1.75 eV band is associated with Si nanocrystals formed from Si clusters in a-SiO2 by the high-dose gamma irradiation. (C) 1996 American Institute of Physics.
引用
收藏
页码:3513 / 3517
页数:5
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