Visible photoluminescence from Si clusters in gamma-irradiated amorphous SiO2

被引:127
|
作者
Nishikawa, H
Watanabe, E
Ito, D
Sakurai, Y
Nagasawa, K
Ohki, Y
机构
[1] SHONAN INST TECHNOL,DEPT ELECT ENGN,FUJISAWA,KANAGAWA 251,JAPAN
[2] WASEDA UNIV,DEPT ELECT ELECT & COMP ENGN,SHINJUKU KU,TOKYO 169,JAPAN
关键词
D O I
10.1063/1.363223
中图分类号
O59 [应用物理学];
学科分类号
摘要
Visible photoluminescence (PL) bands around 2 eV were studied in Co-60 gamma-irradiated (dose<1 MGy) oxygen-deficient-type amorphous SiO2 (a-SiO2) excited by 2-4 eV photons. In addition to the well-known 1.9 eV PL band due to nonbridging oxygen hole centers, another PL band was observed at 2.2 eV when excited by 3.8 eV photons. The intensity of the 2.2 eV band increases with decreasing oxygen partial pressure during the sample preparation. Electron-spin-resonance measurements show that the intensity of the 2.2 eV band is correlated with the concentration of the E'(delta) center, a paramagnetic state of a cluster of silicons. After much higher gamma irradiation with a dose up to 10 MGy, a new PL band was induced at 1.75 eV under excitation by 2.5 eV photons, as well as the 1.9 and 2.2 eV PL bands. By comparing its spectral shape and excitation energy with known PL band in Si-implanted a-SiO2, it is suggested that the 1.75 eV band is associated with Si nanocrystals formed from Si clusters in a-SiO2 by the high-dose gamma irradiation. (C) 1996 American Institute of Physics.
引用
收藏
页码:3513 / 3517
页数:5
相关论文
共 50 条
  • [1] The origin of photoluminescence lines in irradiated amorphous SiO2
    Bakos, T
    Rashkeev, SN
    Pantelides, ST
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2002, 49 (06) : 2713 - 2717
  • [2] Photoluminescence from Si ion irradiated SiO2/Si/SiO2 films with elevated substrate temperature
    Kim, HB
    Son, JH
    Chae, KH
    Jeong, JY
    Lee, WS
    Im, S
    Song, JH
    Whang, CN
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2000, 69 : 401 - 405
  • [3] Density of states at a gamma-irradiated Si/SiO2 interface: The effect of ultrasonic treatment
    Parchinskii P.B.
    Russian Microelectronics, 2005, 34 (6) : 356 - 358
  • [4] Visible photoluminescence and quantum confinement effects in amorphous Si/SiO2 multilayer structures
    Nihonyanagi, S
    Nishimoto, K
    Kanemitsu, Y
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2002, 299 : 1095 - 1099
  • [5] Photoluminescence from SiO2/Si/SiO2 structures
    Photopoulos, P
    Nassiopoulou, AG
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2003, 15 (21) : 3641 - 3650
  • [6] Visible photoluminescence in ion beam mixed SiO2/Si/SiO2 layers
    Chae, KH
    Son, JH
    Chang, GS
    Kim, HB
    Jeong, JY
    Im, S
    Song, JH
    Kim, KJ
    Kim, HK
    Whang, CN
    NANOSTRUCTURED MATERIALS, 1999, 11 (08): : 1239 - 1243
  • [7] Visible photoluminescence induced in Si/SiO2 samples by Si implantation
    Lan, AD
    Liu, BX
    Bai, XD
    JOURNAL OF PHYSICS-CONDENSED MATTER, 1997, 9 (23) : 4987 - 4993
  • [8] Comparison of visible photoluminescence from Si ion-irradiated SiO2/Si/SiO2 films fabricated by ion beam sputtering deposition and electron beam evaporation
    Kim, HB
    Son, JH
    Whang, CN
    Chae, KH
    THIN SOLID FILMS, 2004, 467 (1-2) : 176 - 181
  • [9] Photoluminescence dynamics of amorphous Si/SiO2 quantum wells
    Kanemitsu, Y
    Iiboshi, M
    Kushida, T
    APPLIED PHYSICS LETTERS, 2000, 76 (16) : 2200 - 2202
  • [10] THE DOSE DEPENDENCE OF THE DEFECT FORMATION IN BETA-IRRADIATED AND GAMMA-IRRADIATED SIO2
    GRITSYNA, VT
    ZAIONCHKOVSKII, VV
    KORNEYEVA, TI
    POLAKOV, NI
    IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII FIZIKA, 1981, (01): : 48 - 52