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Epitaxial growth of Bi ultra-thin films on GaAs by electrodeposition
被引:9
作者:
Plaza, M.
[1
]
Abuin, M.
[1
,2
]
Mascaraque, A.
[1
,2
]
Gonzalez-Barrio, M. A.
[1
,2
]
Perez, L.
[1
,3
]
机构:
[1] Univ Complutense Madrid, Dpto Fis Mat, E-28040 Madrid, Spain
[2] Unidad Asociada IQFR CSIC UCM, Madrid 28040, Spain
[3] Univ Politecn Madrid, Inst Sistemas Optoelect & Microtecnol, E-28040 Madrid, Spain
关键词:
Atomic Force Microscopy (AFM);
Thin films;
Epitaxial growth;
Electrochemical tecniques;
MAGNETOTRANSPORT PROPERTIES;
LARGE MAGNETORESISTANCE;
BISMUTH;
SURFACE;
DIODES;
D O I:
10.1016/j.matchemphys.2012.03.027
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
We report on the growth of thin bismuth films on GaAs substrates with different orientations by means of electrochemical deposition. Atomic force microscopy reveals that the films are continuous and exhibit low roughness when they are grown under the appropriate overpotential. omega-2 theta X-ray diffraction scans only show reflections that can be indexed as (0 1 L), meaning that Bi grows onto GaAs only in combinations of the (0 0 1) and (0 1 0) orientations. The matching between the GaAs substrate and the Bi layer has been studied by asymmetric X-ray scans, finding that Bi grows epitaxially on GaAs(1 1 0) and GaAs(1 1 1)B, both As-terminated surfaces. We explain these results by structural and chemical considerations. (C) 2012 Elsevier B.V. All rights reserved.
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页码:523 / 530
页数:8
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