Protective properties of YSZ/Ti film deposited on CoSb3 thermoelectric material

被引:5
作者
Zhao, Degang [1 ]
Bai, Shengqiang [2 ]
Ma, Qian [1 ]
Zuo, Min [1 ]
Teng, Xinying [1 ]
机构
[1] Univ Jinan, Sch Mat Sci & Engn, Jinan 250022, Peoples R China
[2] Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China
基金
中国国家自然科学基金;
关键词
Sputtered films; SEM; Oxide coating; RELIABILITY EVALUATION; TEMPERATURE; OXIDATION; MICROSTRUCTURE; BEHAVIOR; GROWTH; SKUTTERUDITES; RESISTANCE; KINETICS;
D O I
10.1016/j.corsci.2015.05.011
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The YSZ (yttria-stabilized zirconia)/Ti film was deposited on CoSb3 substrate by magnetron sputtering to suppress the sublimation of antimony in CoSb3 during thermal aging test. Both YSZ and Ti film were columnar crystal. The YSZ film typically grew on Ti film in the island mode. No cracks, porosity or other defects were observed on YSZ film. The weight loss per unit area of CoSb3 samples coated with YSZ/Ti film was much lower than that of uncoated CoSb3 sample after accelerated thermal aging test. The results indicated that the sublimation of antimony in CoSb3 was effectively suppressed by YSZ/Ti film. (C) 2015 Elsevier Ltd. All rights reserved.
引用
收藏
页码:163 / 169
页数:7
相关论文
共 32 条
[1]   Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures [J].
Aissa, K. Ait ;
Achour, A. ;
Camus, J. ;
Le Brizoual, L. ;
Jouan, P-Y. ;
Djouadi, M-A. .
THIN SOLID FILMS, 2014, 550 :264-267
[2]   Characterization of zirconia films deposited by rf magnetron sputtering [J].
Ben Amor, S ;
Rogier, B ;
Baud, G ;
Jacquet, M ;
Nardin, M .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1998, 57 (01) :28-39
[3]   Thermal Cycling Effects on the Thermoelectric Properties of n-Type In,Ce-Based Skutterudite Compounds [J].
Biswas, Krishnendu ;
Subramanian, M. A. ;
Good, Morris S. ;
Roberts, Kamandi C. ;
Hendricks, Terry J. .
JOURNAL OF ELECTRONIC MATERIALS, 2012, 41 (06) :1615-1621
[4]   Nanostructured materials for thermoelectric applications [J].
Bux, Sabah K. ;
Fleurial, Jean-Pierre ;
Kaner, Richard B. .
CHEMICAL COMMUNICATIONS, 2010, 46 (44) :8311-8324
[5]   Thermoelectric properties and micro-structure characteristics of annealed N-type bismuth telluride thin film [J].
Cai Zhao-kun ;
Fan Ping ;
Zheng Zhuang-hao ;
Liu Peng-juan ;
Chen Tian-bao ;
Cai Xing-min ;
Luo Jing-ting ;
Liang Guang-xing ;
Zhang Dong-ping .
APPLIED SURFACE SCIENCE, 2013, 280 :225-228
[6]   Thermal treatment effects on interfacial layer formation between ZrO2 thin films and Si substrates [J].
Choi, HS ;
Seol, KS ;
Kim, DY ;
Kwak, JS ;
Son, CS ;
Choi, IH .
VACUUM, 2005, 80 (04) :310-316
[7]   The influence of deposition temperature on microstructure and corrosion resistance of ZrOxNY/ZrO2 coatings deposited using RF sputtering [J].
Cubillos, G. I. ;
Bethencourt, M. ;
Olaya, J. J. ;
Alfonso, J. E. ;
Marco, J. F. .
APPLIED SURFACE SCIENCE, 2014, 309 :181-187
[8]   Fabrication and thermal aging behavior of skutterudites with silica-based composite protective coatings [J].
Dong, Hongliang ;
Li, Xiaoya ;
Tang, Yunshan ;
Zou, Ji ;
Huang, Xiangyang ;
Zhou, Yanfei ;
Jiang, Wan ;
Zhang, Guo-jun ;
Chen, Lidong .
JOURNAL OF ALLOYS AND COMPOUNDS, 2012, 527 :247-251
[9]   Protective Properties of Magnetron-Sputtered Cr-Si Layers on CoSb3 [J].
Godlewska, E. ;
Zawadzka, K. ;
Mars, K. ;
Mania, R. ;
Wojciechowski, K. ;
Opoka, A. .
OXIDATION OF METALS, 2010, 74 (3-4) :205-213
[10]   Yttria partially stabilised zirconia as diffusion barrier between NiCrAlY and Ni-base single crystal Rene N5 superalloy [J].
Guo, Cean ;
Wang, Wen ;
Cheng, Yuxian ;
Zhu, Shenglong ;
Wang, Fuhui .
CORROSION SCIENCE, 2015, 94 :122-128