Etching and structure changes in PMMA coating under argon plasma immersion ion implantation

被引：27

作者：

Kondyurin, Alexey ^{[1
]}

Bilek, Marcela ^{[1
]}

机构：

[1] Univ Sydney, Sch Phys A28, Sydney, NSW 2006, Australia

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2011年 / 269卷 / 12期

基金：

澳大利亚研究理事会;

关键词：

Plasma immersion ion implantation; PMMA; Ellipsometry; FTIR; SURFACE MODIFICATION; POLYSTYRENE FILMS; POLY(METHYL METHACRYLATE); BEAM MODIFICATION; REFRACTIVE-INDEX; IRRADIATION; ATTACHMENT; DEPOLYMERIZATION; BOMBARDMENT; TEMPERATURE;

D O I：

10.1016/j.nimb.2011.04.001

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A thin (120 nm) polymethylmethacrylate coating was treated by plasma immersion ion implantation with Ar using pulsed bias at 20 kV. Ellipsometry and FTIR spectroscopy and gel-fraction formation were used to detect the structure transformations as a function of ion fluence. The kinetics of etching, variations in refractive index and extinction coefficient in 400-1000 nm of wavelength, concentration changes in carbonyl, ether, methyl and methylene groups all as a function of ion fluence were analyzed. A critical ion fluence of 10(15) ions/cm(2) was observed to be a border between competing depolymerization and carbonization processes. Chemical reactions responsible for reorganization of the PMMA chemical structure under ion beam treatment are proposed. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：1361 / 1369

页数：9

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